Microwave Plasma Assisted Chemical Vapor Deposition of Ultra-nanocrystalline Diamond Films
Author | : Wen-Shin Huang |
Publisher | : |
Total Pages | : 798 |
Release | : 2004 |
Genre | : Chemical vapor |
ISBN | : |
Download Microwave Plasma Assisted Chemical Vapor Deposition Of Ultra Nanocrystalline Diamond Films full books in PDF, epub, and Kindle. Read online free Microwave Plasma Assisted Chemical Vapor Deposition Of Ultra Nanocrystalline Diamond Films ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Author | : Wen-Shin Huang |
Publisher | : |
Total Pages | : 798 |
Release | : 2004 |
Genre | : Chemical vapor |
ISBN | : |
Author | : Dzung Tri Tran |
Publisher | : |
Total Pages | : 314 |
Release | : 2005 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Zhenqing Xu |
Publisher | : |
Total Pages | : 198 |
Release | : 2003 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Shih-Feng Chou |
Publisher | : |
Total Pages | : 174 |
Release | : 2005 |
Genre | : |
ISBN | : |
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Author | : Gregory P. Vierkant |
Publisher | : |
Total Pages | : 212 |
Release | : 2006 |
Genre | : Diamond thin films |
ISBN | : |
Author | : Olga A. Shenderova |
Publisher | : William Andrew |
Total Pages | : 582 |
Release | : 2012-09-11 |
Genre | : Science |
ISBN | : 1437734650 |
Ultrananocrystalline Diamond: Synthesis, Properties, and Applications is a unique practical reference handbook. Written by the leading experts worldwide it introduces the science of UNCD for both the R&D community and applications developers using UNCD in a diverse range of applications from macro to nanodevices, such as energy-saving ultra-low friction and wear coatings for mechanical pump seals and tools, high-performance MEMS/NEMS-based systems (e.g. in telecommunications), the next generation of high-definition flat panel displays, in-vivo biomedical implants, and biosensors. This work brings together the basic science of nanoscale diamond structures, with detailed information on ultra-nanodiamond synthesis, properties, and applications. The book offers discussion on UNCD in its two forms, as a powder and as a chemical vapor deposited film. Also discussed are the superior mechanical, tribological, transport, electrochemical, and electron emission properties of UNCD for a wide range of applications including MEMS/ NEMS, surface acoustic wave (SAW) devices, electrochemical sensors, coatings for field emission arrays, photonic and RF switching, biosensors, and neural prostheses, etc. Ultrananocrystalline Diamond summarises the most recent developments in the nanodiamond field, and presents them in a way that will be useful to the R&D community in both academic and corporate sectors. Coverage of both nanodiamond particles and films make this a valuable resource for both the nanotechnology community and the field of thin films / vacuum deposition. Written by the world's leading experts in nanodiamond, this second edition builds on its predecessor's reputation as the most up-to-date resource in the field.