High-Entropy Alloys

High-Entropy Alloys
Author: Michael C. Gao
Publisher: Springer
Total Pages: 524
Release: 2016-04-27
Genre: Technology & Engineering
ISBN: 3319270133

This book provides a systematic and comprehensive description of high-entropy alloys (HEAs). The authors summarize key properties of HEAs from the perspective of both fundamental understanding and applications, which are supported by in-depth analyses. The book also contains computational modeling in tackling HEAs, which help elucidate the formation mechanisms and properties of HEAs from various length and time scales.

Oxide Thin Films, Multilayers, and Nanocomposites

Oxide Thin Films, Multilayers, and Nanocomposites
Author: Paolo Mele
Publisher: Springer
Total Pages: 320
Release: 2015-03-26
Genre: Technology & Engineering
ISBN: 3319144782

This book provides a comprehensive overview of the science of nanostructured oxides. It details the fundamental techniques and methodologies involved in oxides thin film and bulk growth, characterization and device processing, as well as heterostructures. Both, experts in oxide nanostructures and experts in thin film heteroepitaxy, contribute the interactions described within this book.

Fundamentals of Semiconductor Processing Technology

Fundamentals of Semiconductor Processing Technology
Author: Badih El-Kareh
Publisher: Springer Science & Business Media
Total Pages: 605
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 1461522099

The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Thin Films and Heterostructures for Oxide Electronics

Thin Films and Heterostructures for Oxide Electronics
Author: Satishchandra B. Ogale
Publisher: Springer Science & Business Media
Total Pages: 416
Release: 2005-11-21
Genre: Technology & Engineering
ISBN: 0387260897

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11

Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11
Author: Electrochemical society. Meeting
Publisher: The Electrochemical Society
Total Pages: 950
Release: 2011
Genre: Science
ISBN: 1566778654

This issue of ECS Transactions contains the peer-reviewed full length papers of the International Symposium on Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics held May 1-6, 2011 in Montreal as a part of the 219th Meeting of The Electrochemical Society. The papers address a very diverse range of topics. In addition to the deposition and characterization of the dielectrics, more specific topics addressed by the papers include applications, device characterization and reliability, interface states, interface traps, defects, transistor and gate oxide studies, and modeling.