Metal Oxide Defects
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| Author | : Vijay Kumar |
| Publisher | : Elsevier |
| Total Pages | : 756 |
| Release | : 2022-12 |
| Genre | : Technology & Engineering |
| ISBN | : 0323855881 |
Metal Oxide Defects: Fundamentals, Design, Development and Applications provides a broad perspective on the development of advanced experimental techniques to study defects and their chemical activity and catalytic reactivity in various metal oxides. The book highlights advances in characterization and analytical techniques to achieve better understanding of a wide range of defects, most importantly, state-of-the-art methodologies for controlling defects. The book provides readers with pathways to apply basic principles and interpret the behavior of metal oxides. After reviewing characterization and analytical techniques, the book focuses on the relationship of defects to the properties and performance of metal oxides. Finally, there is a review of the methods to control defects and the applications of defect engineering for the design of metal oxides for applications in optoelectronics, energy, sensing, and more. Reviews advances in characterization and analytical techniques to understand the behavior of defects in metal oxides materials Introduces defect engineering applied to the design of metal oxide materials with desirable properties Discusses applications of defect engineering to enhance the performance of materials for a wide range of applications, with an emphasis on optoelectronics
| Author | : Robert Jaffee |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 598 |
| Release | : 2013-11-21 |
| Genre | : Technology & Engineering |
| ISBN | : 1461587239 |
DEFECTS AND TRANSPORT IN OXIDES is the proceedings of the eighth Battelle Colloquium in the Materials Sciences, held in Columbus and Salt Fork, Ohio, September 17-22, 1973. It took as its theme the relationship between defects and transport of both mass and charge in oxides. Applications of defect-controlled transport to a number of important processes in oxides also were covered. In selecting this topic, the Organizing Committee thought that 1973 was timely to bring together the leading theoretical and experimental researchers in the oxide transport field to review its status in a critical way, and to consider current major research directions and how research in the future might be guided into fruitful areas. The meeting was highlighted by the presentation of several papers which suggest that major advances in our understanding of transport in oxides appear to be imminent. These papers dealt with the results of new theoretical approaches whereby the energies and configurations of defects may be calculated, and with new experimental techniques for indirectly observing these defects, previously thought to be below the limits of experimental resolving power. Other papers, dealing with the application of defect chemistry to technological processes, served to demonstrate the successes and to point out yet unresolved problems associated with ix x PREFACE understanding the chemistry of imperfect crystals.
| Author | : Jacques Jupille |
| Publisher | : Springer |
| Total Pages | : 472 |
| Release | : 2015-02-09 |
| Genre | : Science |
| ISBN | : 3319143670 |
This book presents the basics and characterization of defects at oxide surfaces. It provides a state-of-the-art review of the field, containing information to the various types of surface defects, describes analytical methods to study defects, their chemical activity and the catalytic reactivity of oxides. Numerical simulations of defective structures complete the picture developed. Defects on planar surfaces form the focus of much of the book, although the investigation of powder samples also form an important part. The experimental study of planar surfaces opens the possibility of applying the large armoury of techniques that have been developed over the last half-century to study surfaces in ultra-high vacuum. This enables the acquisition of atomic level data under well-controlled conditions, providing a stringent test of theoretical methods. The latter can then be more reliably applied to systems such as nanoparticles for which accurate methods of characterization of structure and electronic properties have yet to be developed. The book gives guidance to tailor oxide surfaces by controlling the nature and concentration of defects. The importance of defects in the physics and chemistry of metal oxide surfaces is presented in this book together with the prominent role of oxides in common life. The book contains contributions from leaders in the field. It serves as a reference for experts and beginners in the field.
| Author | : Donald Morgan Smyth |
| Publisher | : Oxford University Press on Demand |
| Total Pages | : 294 |
| Release | : 2000 |
| Genre | : Science |
| ISBN | : 9780195110142 |
The Defect Chemistry of Metal Oxides is a unique introduction to the equilibrium chemistry of solid inorganic compounds with a focus on metal oxides. Accessible to students with little or no background in defect chemistry, it explains how to apply basic principles and interpret the related behavior of materials. Topics discussed include lattice and electronic defects, doping effects, nonstoichiometry, and mass and charge transport. The text distinctly emphasizes the correlation between the general chemical properties of the constituent elements and the defect chemistry and transport properties of their compounds. It covers the types of defects formed, the effects of dopants, the amount and direction of nonstoichiometry, the depths of acceptor and donor levels, and more. Concluding chapters present up-to-date and detailed analyses of three systems: titanium dioxide, cobalt oxide and nickel oxide, and barium titanate. The Defect Chemistry of Metal Oxides is the only book of its kind that incorporates sample problems for students to solve. Suitable for a variety of courses in materials science and engineering, chemistry, and geochemistry, it also serves as a valuable reference for researchers and instructors.
| Author | : Vijay Kumar |
| Publisher | : Elsevier |
| Total Pages | : 758 |
| Release | : 2022-11-19 |
| Genre | : Technology & Engineering |
| ISBN | : 0323903592 |
Metal Oxide Defects: Fundamentals, Design, Development and Applications provides a broad perspective on the development of advanced experimental techniques to study defects and their chemical activity and catalytic reactivity in various metal oxides. This book highlights advances in characterization and analytical techniques to achieve better understanding of a wide range of defects, most importantly, state-of-the-art methodologies for controlling defects. The book provides readers with pathways to apply basic principles and interpret the behavior of metal oxides. After reviewing characterization and analytical techniques, the book focuses on the relationship of defects to the properties and performance of metal oxides. Finally, there is a review of the methods to control defects and the applications of defect engineering for the design of metal oxides for applications in optoelectronics, energy, sensing, and more. This book is a key reference for materials scientists and engineers, chemists, and physicists. Reviews advances in characterization and analytical techniques to understand the behavior of defects in metal oxide materials Introduces defect engineering applied to the design of metal oxide materials with desirable properties Discusses applications of defect engineering to enhance the performance of materials for a wide range of applications, with an emphasis on optoelectronics
| Author | : Satishchandra Balkrishna Ogale |
| Publisher | : John Wiley & Sons |
| Total Pages | : 478 |
| Release | : 2013-11-08 |
| Genre | : Technology & Engineering |
| ISBN | : 3527654887 |
Functional oxides are used both as insulators and metallic conductors in key applications across all industrial sectors. This makes them attractive candidates in modern technology ? they make solar cells cheaper, computers more efficient and medical instrumentation more sensitive. Based on recent research, experts in the field describe novel materials, their properties and applications for energy systems, semiconductors, electronics, catalysts and thin films. This monograph is divided into 6 parts which allows the reader to find their topic of interest quickly and efficiently. * Magnetic Oxides * Dopants, Defects and Ferromagnetism in Metal Oxides * Ferroelectrics * Multiferroics * Interfaces and Magnetism * Devices and Applications This book is a valuable asset to materials scientists, solid state chemists, solid state physicists, as well as engineers in the electric and automotive industries.
| Author | : Gregory A. Carson |
| Publisher | : |
| Total Pages | : 240 |
| Release | : 1997 |
| Genre | : |
| ISBN | : |
| Author | : Shriram Ramanathan |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 344 |
| Release | : 2009-12-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1441906649 |
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
| Author | : Oliver Diwald |
| Publisher | : John Wiley & Sons |
| Total Pages | : 903 |
| Release | : 2021-09-14 |
| Genre | : Technology & Engineering |
| ISBN | : 1119436745 |
Metal Oxide Nanoparticles A complete nanoparticle resource for chemists and industry professionals Metal oxide nanoparticles are integral to a wide range of natural and technological processes—from mineral transformation to electronics. Additionally, the fields of engineering, electronics, energy technology, and electronics all utilize metal oxide nanoparticle powders. Metal Oxide Nanoparticles: Formation, Functional Properties, and Interfaces presents readers with the most relevant synthesis and formulation approaches for using metal oxide nanoparticles as functional materials. It covers common processing routes and the assessment of physical and chemical particle properties through comprehensive and complementary characterization methods. This book will serve as an introduction to nanoparticle formulation, their interface chemistry and functional properties at the nanoscale. It will also act as an in-depth resource, sharing detailed information on advanced approaches to the physical, chemical, surface, and interface characterization of metal oxide nanoparticle powders and dispersions. Addresses the application of metal oxide nanoparticles and its economic impact Examines particle synthesis, including the principles of selected bottom-up strategies Explores nanoparticle formulation—a selection of processing and application routes Discusses the significance of particle surfaces and interfaces on structure formation, stability and functional materials properties Covers metal oxide nanoparticle characterization at different length scales With this valuable resource, academic researchers, industrial chemists, and PhD students can all gain insight into the synthesis, properties, and applications of metal oxide nanoparticles.
| Author | : Ramakrishnan Vaidyanathan |
| Publisher | : ProQuest |
| Total Pages | : 172 |
| Release | : 2007 |
| Genre | : |
| ISBN | : 9780549342199 |
The technologically useful properties of a solid often depend upon the types and concentrations of the defects it contains. Defects mediate foreign-atom diffusion in semiconductors, affect the performance of photo-active devices, the effectiveness of catalysts, the sensitivity of solid-state electrolyte sensors, and the efficiency of devices for converting sunlight to electrical power. Current methods for controlling defect behavior suffer from problems with solid consumption, implantation damage, or foreign atom incorporation. My laboratory has recently discovered two entirely new methods for controlling defect concentration and diffusion in silicon, based on separate mechanisms involving surface chemistry and optical stimulation. In the present work, the science base describing the surface and optical phenomena, observed in silicon, is placed on firmer ground, and to show more specifically how they might be employed usefully in practical applications such as ultrashallow junction (USJ) formation. The results show that it possible to simultaneously reduce junction depth, improve percentage dopant activated and minimize implantation damage, the key parameters in USJ formation. The basic physical explanations outlined for silicon suggest that similar chemistry and physics should also govern the behavior of other semiconductors as well, such as metal oxides. Titanium dioxide (TiO2) is an ideal test case because of the presence of charged point defects and also its broad applications. Through nonthermal optical stimulation the results show that illumination inhibits the diffusion of oxygen in TiO2.
