Memory Quality Silicon Nitride Deposited by Plasma-enhanced Chemical Vapor Deposition
Author | : Muhammad Abdul Khaliq |
Publisher | : |
Total Pages | : 368 |
Release | : 1988 |
Genre | : Metal oxide semiconductors |
ISBN | : |
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Author | : Muhammad Abdul Khaliq |
Publisher | : |
Total Pages | : 368 |
Release | : 1988 |
Genre | : Metal oxide semiconductors |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : |
Release | : 2016 |
Genre | : |
ISBN | : |
Abstract: To prevent moisture and oxygen permeation into flexible organic electronic devices formed on substrates, the deposition of an inorganic diffusion barrier material such as SiN x is important for thin film encapsulation. In this study, by a very high frequency (162 MHz) plasma-enhanced chemical vapor deposition (VHF-PECVD) using a multi-tile push–pull plasma source, SiN x layers were deposited with a gas mixture of NH3 /SiH4 with/without N2 and the characteristics of the plasma and the deposited SiN x film as the thin film barrier were investigated. Compared to a lower frequency (60 MHz) plasma, the VHF (162 MHz) multi-tile push–pull plasma showed a lower electron temperature, a higher vibrational temperature, and higher N2 dissociation for an N2 plasma. When a SiN x layer was deposited with a mixture of NH3 /SiH4 with N2 at a low temperature of 100 °C, a stoichiometric amorphous Si3 N4 layer with very low Si–H bonding could be deposited. The 300 nm thick SiN x film exhibited a low water vapor transmission rate of 1.18 × 10 −4 g (m 2 · d) −1, in addition to an optical transmittance of higher than 90%.
Author | : Vikram J. Kapoor |
Publisher | : |
Total Pages | : 570 |
Release | : 1987 |
Genre | : Electric and insulation |
ISBN | : |
Author | : Sui-Yuan Lynn |
Publisher | : |
Total Pages | : 212 |
Release | : 1987 |
Genre | : Silicon nitride |
ISBN | : |
Author | : Kei-Turng Shih |
Publisher | : |
Total Pages | : 158 |
Release | : 1991 |
Genre | : Ditertiary-butyl silane |
ISBN | : |
Author | : Ronald James Spence |
Publisher | : |
Total Pages | : 460 |
Release | : 1993 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |