Materials Under Extreme Conditions and Nanophase Materials

Materials Under Extreme Conditions and Nanophase Materials
Author: G. Kostorz
Publisher: North Holland
Total Pages: 296
Release: 1993
Genre: Technology & Engineering
ISBN:

The contents of the Symposium B on Materials under Extreme Conditions cover a variety of extremes, in particular high rates of deformation, low temperatures, high temperatures, high pressure, thermal shock, high currents, corrosion and wear, surface processing, and high purity. The subjects are arranged in the following sequence: mechanical properties of metallic and ceramic materials under various extreme conditions, wear, surface properties and processing, internal stresses and high pressure and high purity. The Symposium C on Nanophase Materials dealt primarily with the preparation methods and physical/chemical properties of ultrafine grained polycrystalline materials and was particularly concerned with the relationship between manufacturing conditions and properties of these nanophase materials. The subjects covered include ultrafine particle synthesis, consolidation and properties of nanophase metals, nanoceramics and nanocomposites.

C, H, N and O in Si and Characterization and Simulation of Materials and Processes

C, H, N and O in Si and Characterization and Simulation of Materials and Processes
Author: A. Borghesi
Publisher: Newnes
Total Pages: 580
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 044459633X

Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.

Small Scale Structures

Small Scale Structures
Author: N.F. de Rooij
Publisher: Elsevier
Total Pages: 559
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0444596305

This book contains the proceedings of 3 symposia dealing with various aspects of small scale structures. Symposium A deals with the development of new materials, including ceramics, polymers, metals, etc., their microstructuring as well as their potential for application in microsystems. All kinds of microsystems are considered, e.g. mechanical, magnetic, optical, chemical, biochemical and issues related to assembly and packaging were also covered.Symposium B deals with four topics: synthesis and preparation of nanostructured ceramics and composites with well-controlled geometric order and chemical composition; coupling of these structures to transducers for current and future chemical and biochemical devices based upon microoptics, microelectronics, microionics, microelectrodes or molecular cages; planar thin film structures and the control of covalent thin film/transducer couplings, the control of selective, stable and sensitive recognition centers at the surface, at grain boundaries or in the bulk of selected nanostructured materials with extremely narrow particle size distributions; analysis of these structures and sensor functions by means of techniques utilizing photons, electrons, ions, or atomic particle beam probes.Symposium E examines the structure-property relationships in thin films and multilayers, from the point of view of both fundamental studies and practical applications.

Chemistry Under Extreme and Non-Classical Conditions

Chemistry Under Extreme and Non-Classical Conditions
Author: Rudi van Eldik
Publisher: John Wiley & Sons
Total Pages: 586
Release: 1996-12-06
Genre: Science
ISBN: 9780471165613

The very best and latest advances compiled in a single volume-an ideal resource for graduate students and researchers . . . Here is the perfect introduction to chemistry under extreme or non-classical conditions, including use of high temperature species, high pressure, supercritical media, sonochemistry, and microwave chemistry. Written by leading experts in their respective fields, this unique text applies a unified approach to each method, including background, instrumentation, examples, information on industrial applications (where relevant), and sources for further reading. Featured topics: * Chemical Synthesis Using High Temperature Species * Effect of Pressure on Inorganic Reactions * Effect of Pressure on Organic Reactions * Organic Synthesis at High Pressure * Inorganic and Related Chemical Reactions in Supercritical Fluids * Organic Chemistry in Supercritical Fluids * Industrial and Environmental Applications of Supercritical Fluids * Ultrasound as a New Tool for Synthetic Chemists * Applications of High Intensity Ultrasound in Polymer Chemistry * Chemistry Under Extreme Conditions in Water Induced Electrohydraulic Cavitation and Pulsed-Plasma Discharges * Microwave Dielectric Heating Effects in Chemical Synthesis * Biomolecules Under Extreme Conditions

Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

Ion Beam Processing of Materials and Deposition Processes of Protective Coatings
Author: P.L.F. Hemment
Publisher: Newnes
Total Pages: 630
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0444596313

Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

Selected Topics in Group IV and II-VI Semiconductors

Selected Topics in Group IV and II-VI Semiconductors
Author: E.H.C. Parker
Publisher: Newnes
Total Pages: 465
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0444596437

This book contains the proceedings of two symposia which brought together crystal growers, chemists and physicists from across the world. The first part is concerned with silicon molecular beam epitaxy and presents an overview of the most research being done in the field. Part two discusses the problems dealing with purification, doping and defects of II-VI materials, mainly of the important semiconductors CdTe and ZnSe. The focus is on materials science issues which are the key for a better understanding of these materials and for any industrial application.

Laser Ablation

Laser Ablation
Author: E. Fogarassy
Publisher: Newnes
Total Pages: 943
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0444596321

This book contains the proceedings of the largest conference ever held on this subject. The strong interest in this field is largely due to the fact that both fundamental aspects of laser-surface interaction as well as applied techniques for thin film generation and patterning were treated in detail by experts from around the world.

Porous Silicon: Material, Technology and Devices

Porous Silicon: Material, Technology and Devices
Author: H. Münder
Publisher: Newnes
Total Pages: 344
Release: 1996-07-08
Genre: Science
ISBN: 0444596348

These proceedings represent the most recent progress in the field of porous silicon. Several papers present results in which the influence of the formation parameters on the structural and optical properties has been investigated. Further topics dealt with include: the influence of light during the formation process on the photoluminescence behaviour; fundamental mechanism of the photoluminescence; the electroluminescence of porous silicon; applications based on porous silicon; charge carrier transport.