Materials Characterization Using Novel Ion Beam Techniques
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Author | : Bernd Schmidt |
Publisher | : Springer Science & Business Media |
Total Pages | : 425 |
Release | : 2012-12-13 |
Genre | : Technology & Engineering |
ISBN | : 3211993568 |
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Author | : J. R. Bird |
Publisher | : Academic Press |
Total Pages | : 748 |
Release | : 1989 |
Genre | : Science |
ISBN | : |
The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.
Author | : Charles A. Evans |
Publisher | : Gulf Professional Publishing |
Total Pages | : 784 |
Release | : 1992 |
Genre | : Science |
ISBN | : 9780750691680 |
"This is a comprehensive volume on analytical techniques used in materials science for the characterization of surfaces, interfaces and thin films. This flagship volume is a unique, stand-alone reference for materials science practitioners, process engineers, students and anyone with a need to know about the capabilities available in materials analysis. An encyclopedia of 50 concise articles, this book will also be a practical companion to the forthcoming books in the series."--Knovel.
Author | : Michael Nastasi |
Publisher | : CRC Press |
Total Pages | : 476 |
Release | : 2014-08-27 |
Genre | : Science |
ISBN | : 1439846383 |
Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. Examines classical collision theory Details the fundamentals of five specific ion beam analysis techniques Illustrates specific applications, including biomedicine and thin film analysis Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.
Author | : James W. Mayer |
Publisher | : Elsevier |
Total Pages | : 511 |
Release | : 2012-12-02 |
Genre | : Science |
ISBN | : 0323139868 |
Ion Beam Handbook for Material Analysis emerged from the U.S.-Italy Seminar on Ion Beam Analysis of Near Surface Regions held at the Baia-Verde Hotel, Catania, June 17-20, 1974. The seminar was sponsored by the National Science Foundation and the Consiglio Nazionale delle Ricerche under the United States-Italy Cooperative Science Program. The book provides a useful collection of tables, graphs, and formulas for those involved in ion beam analysis. These tables, graphs, and formulas are divided into five chapters that cover the following topics: energy loss and energy straggling; backscattering spectrometry; channeling; applications of ion-induced nuclear reactions; and the use of ion-induced X-ray yields.
Author | : J. Thomas |
Publisher | : Springer Science & Business Media |
Total Pages | : 521 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 1468408569 |
The extensive use of low-energy accelerators in non-nuclear physics has now reached the stage where these activities are recognized as a natural field of investigation. Many other areas in physics and chemistry have undergone similarly spectacular development: beam foil spectroscopy in atomic physics, studies in atomic collisions, materials implantation, defects creation, nuclear microanalysis, and so on. Now, this most recent activity by itself and in its evident connec tion with the others has brought a new impetus to both the funda mental and the applied aspects of materials science. A summer school on "Material Characterization Using Ion Beams" has resulted from these developments and the realization that the use of ion beams is not restricted to accelerators but covers a wide energy range in the developing technology. The idea of the ion beam as a common denominator of many act1v1t1es dealing with surface and near-surface characterization was enthu siastically received by many scientists and a school on this subject received the positive endorsement of NATO. The Advanced Study Institute on Materials Science has assumed for us the status of an "institution" leading to better contact among the many laboratories engaged in this field. The fourth Institute in this series was held in Aleria, Corsica, between August 22 and September 12, 1976.
Author | : David Brandon |
Publisher | : John Wiley & Sons |
Total Pages | : 517 |
Release | : 2013-03-21 |
Genre | : Technology & Engineering |
ISBN | : 1118681487 |
Microstructural characterization is usually achieved by allowing some form of probe to interact with a carefully prepared specimen. The most commonly used probes are visible light, X-ray radiation, a high-energy electron beam, or a sharp, flexible needle. These four types of probe form the basis for optical microscopy, X-ray diffraction, electron microscopy, and scanning probe microscopy. Microstructural Characterization of Materials, 2nd Edition is an introduction to the expertise involved in assessing the microstructure of engineering materials and to the experimental methods used for this purpose. Similar to the first edition, this 2nd edition explores the methodology of materials characterization under the three headings of crystal structure, microstructural morphology, and microanalysis. The principal methods of characterization, including diffraction analysis, optical microscopy, electron microscopy, and chemical microanalytical techniques are treated both qualitatively and quantitatively. An additional chapter has been added to the new edition to cover surface probe microscopy, and there are new sections on digital image recording and analysis, orientation imaging microscopy, focused ion-beam instruments, atom-probe microscopy, and 3-D image reconstruction. As well as being fully updated, this second edition also includes revised and expanded examples and exercises, with a solutions manual available at http://develop.wiley.co.uk/microstructural2e/ Microstructural Characterization of Materials, 2nd Edition will appeal to senior undergraduate and graduate students of material science, materials engineering, and materials chemistry, as well as to qualified engineers and more advanced researchers, who will find the book a useful and comprehensive general reference source.
Author | : A.K. Tyagi |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 516 |
Release | : 2009-01-02 |
Genre | : Science |
ISBN | : 303813323X |
Volume is indexed by Thomson Reuters BCI (WoS). Nowadays, an impressively large number of powerful characterization techniques is being used by physicists, chemists, biologists and engineers in order to solve analytical research problems; especially those related to the investigation of the properties of new materials for advanced applications. Although there are a few available books which deal with such experimental techniques, they are either too exhaustive and cover very few techniques or are too elementary to provide a solid basis for learning to use the characterization technique. Moreover, such books usually over-emphasize the textbook approach: being full of theoretical concepts and mathematical derivations, and omitting the practical instruction required in order to permit newcomers to use the techniques.
Author | : Lucille A. Giannuzzi |
Publisher | : Springer Science & Business Media |
Total Pages | : 362 |
Release | : 2006-05-18 |
Genre | : Science |
ISBN | : 038723313X |
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
Author | : Yale Strausser |
Publisher | : Elsevier |
Total Pages | : 255 |
Release | : 2013-10-22 |
Genre | : Technology & Engineering |
ISBN | : 0080523420 |
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.