Materials And Processes For Next Generation Lithography
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Author | : |
Publisher | : Elsevier |
Total Pages | : 636 |
Release | : 2016-11-08 |
Genre | : Science |
ISBN | : 0081003587 |
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author | : Kaushik Kumar |
Publisher | : Springer |
Total Pages | : 155 |
Release | : 2018-09-26 |
Genre | : Technology & Engineering |
ISBN | : 3319999001 |
This book covers the recent developments in the production of micro and nano size products, which cater to the needs of the industry. The processes to produce the miniature sized products with unique characteristics are addressed. Moreover, their application in areas such as micro-engines, micro-heat exchangers, micro-pumps, micro-channels, printing heads and medical implants are also highlighted. The book presents such microsystem-based products as important contributors to a sustainable economy. The recent research in this book focuses on the development of new micro and nano manufacturing platforms while integrating the different technologies to manufacture the micro and nano components in a high throughput and cost effective manner. The chapters contain original theoretical and applied research in the areas of micro- and nano-manufacturing that are related to process innovation, accuracy, and precision, throughput enhancement, material utilization, compact equipment development, environmental and life-cycle analysis, and predictive modeling of manufacturing processes with feature sizes less than one hundred micrometers.
Author | : Michael Olorunfunmi Kolawole |
Publisher | : CRC Press |
Total Pages | : 472 |
Release | : 2020-06-15 |
Genre | : Technology & Engineering |
ISBN | : 1000089061 |
This book gives clear explanations of the technical aspects of electronics engineering from basic classical device formulations to the use of nanotechnology to develop efficient quantum electronic systems. As well as being up to date, this book provides a broader range of topics than found in many other electronics books. This book is written in a clear, accessible style and covers topics in a comprehensive manner. This book’s approach is strongly application-based with key mathematical techniques introduced, helpful examples used to illustrate the design procedures, and case studies provided where appropriate. By including the fundamentals as well as more advanced techniques, the author has produced an up-to-date reference that meets the requirements of electronics and communications students and professional engineers. Features Discusses formulation and classification of integrated circuits Develops a hierarchical structure of functional logic blocks to build more complex digital logic circuits Outlines the structure of transistors (bipolar, JFET, MOSFET or MOS, CMOS), their processing techniques, their arrangement forming logic gates and digital circuits, optimal pass transistor stages of buffered chain, sources and types of noise, and performance of designed circuits under noisy conditions Explains data conversion processes, choice of the converter types, and inherent errors Describes electronic properties of nanomaterials, the crystallites’ size reduction effect, and the principles of nanoscale structure fabrication Outlines the principles of quantum electronics leading to the development of lasers, masers, reversible quantum gates, and circuits and applications of quantum cells and fabrication methods, including self-assembly (quantum-dot cellular automata) and tunneling (superconducting circuits), and describes quantum error-correction techniques Problems are provided at the end of each chapter to challenge the reader’s understanding
Author | : Bruce W. Smith |
Publisher | : CRC Press |
Total Pages | : 864 |
Release | : 2018-10-03 |
Genre | : Technology & Engineering |
ISBN | : 1420051539 |
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author | : Eric Chappel |
Publisher | : Academic Press |
Total Pages | : 680 |
Release | : 2020-11-07 |
Genre | : Medical |
ISBN | : 0128198397 |
Drug Delivery Devices and Therapeutic Systems examines the current technology and innovations moving drug delivery systems (DDS) forward. The book provides an overview on the therapeutic use of drug delivery devices, including design, applications, and a description of the design of each device. While other books focus on the therapy, the primary emphasis in this book is on current technologies for DDS applications, including microfluidics, nanotechnology, biodegradable hydrogel and microneedles, with a special emphasis on wearable DDS. As part of the Developments in Biomedical Engineering and Bioelectronics series, this book is written by experts in the field and informed with information directly from manufacturers. Pharmaceutical scientists, medical researchers, biomedical engineers and clinical professionals will find this an essential reference. - Provides essential information on the most recent drug delivery systems available - Explains current technology and its applications to drug delivery - Contains contributions from biomedical engineers, pharmaceutical scientists and manufacturers
Author | : Hongbo Lan |
Publisher | : Nova Science Publishers |
Total Pages | : 0 |
Release | : 2011 |
Genre | : Microlithography |
ISBN | : 9781611225013 |
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Author | : Weimin Zhou |
Publisher | : Springer Science & Business Media |
Total Pages | : 270 |
Release | : 2013-01-04 |
Genre | : Technology & Engineering |
ISBN | : 3642344283 |
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Author | : Vivek Bakshi |
Publisher | : SPIE Press |
Total Pages | : 704 |
Release | : 2009 |
Genre | : Art |
ISBN | : 0819469645 |
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author | : Dhiraj Sud |
Publisher | : CRC Press |
Total Pages | : 308 |
Release | : 2022-08-02 |
Genre | : Technology & Engineering |
ISBN | : 1000630099 |
In the manufacturing sector, nanomaterials offer promising outcomes for cost reduction in production, quality improvement, and minimization of environmental hazards. This book focuses on the application of nanomaterials across a wide range of manufacturing areas, including in paint and coatings, petroleum refining, textile and leather industries, electronics, energy storage devices, electrochemical sensors, as well as in industrial waste treatment. This book: Examines nanofluids and nanocoatings in manufacturing and their characterization. Discusses nanomaterial applications in fabricating lightweight structural components, oil refining, smart leather processing and textile industries, and the construction industry. Highlights the role of 3D printing in realizing the full potential of nanotechnology. Considers synthetic strategies with a focus on greener protocols for the fabrication of nanostructured materials with enhanced properties and better control, including these materials' characterization and significant properties for ensuring smart outputs. Offers a unique perspective on applications in industrial waste recycling and treatment, along with challenges in terms of safety, economics, and sustainability in industrial processes. This work is written for researchers and industry professionals across a variety of engineering disciplines, including materials, manufacturing, process, and industrial engineering.
Author | : M Feldman |
Publisher | : Woodhead Publishing |
Total Pages | : 599 |
Release | : 2014-02-13 |
Genre | : Technology & Engineering |
ISBN | : 0857098756 |
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics