Low-Frequency Noise in Advanced MOS Devices

Low-Frequency Noise in Advanced MOS Devices
Author: Martin Haartman
Publisher: Springer Science & Business Media
Total Pages: 224
Release: 2007-08-23
Genre: Technology & Engineering
ISBN: 1402059108

This is an introduction to noise, describing fundamental noise sources and basic circuit analysis, discussing characterization of low-frequency noise and offering practical advice that bridges concepts of noise theory and modelling, characterization, CMOS technology and circuits. The text offers the latest research, reviewing the most recent publications and conference presentations. The book concludes with an introduction to noise in analog/RF circuits and describes how low-frequency noise can affect these circuits.

Low Frequency Noise in Advanced CMOS Technology

Low Frequency Noise in Advanced CMOS Technology
Author: Chia-Yu Chen
Publisher:
Total Pages:
Release: 2010
Genre:
ISBN:

The main topic of this thesis is to investigate the CMOS scaling impacts on low-frequency noise properties. Such effects come from size (channel length/width) scaling, adoption of advanced doping profiles (halo pocket implantation), incorporation of alternative gate oxide (high-[Kappa]) and channel materials (SiGe). Device-level simulation capabilities have been developed to investigate low-frequency noise behavior. The numerical model is based on the impedance field method; it accounts for a trap-induced carrier number fluctuation and a Hooge mobility fluctuation. Simulations based on such models have been conducted for high-[Kappa], SiGe and small gate area transistors, and the results have been correlated with experimental data, which reveals the important role of the CMOS scaling in the low-frequency noise behavior. In the study of high-[Kappa] gate dielectric it is found that carrier number fluctuation becomes the dominant noise source and the non-uniform trap energy distribution is critical to explain low frequency noise behavior. The negative impact of substrate halo doping on the low frequency noise is also studied quantitatively. Low frequency noise characteristics of Si/SiGe/Si hetero-channel MOSFETs (SiGe MOSFETs) are discussed; the study has been obtained in terms of the noise level dependence on gate bias, drain currents, and body bias, revealing the important role of the dual channels in the low-frequency noise behavior of Si/SiGe/Si hetero-channel devices. Low frequency noise characteristics in small gate area MOSFETs are studied in detail. Due to the ever decreasing gate area, the number of charge carriers in a MOSFET channel is continually going down, and single-electron low frequency noise phenomena (random telegraph noise, RTN) becomes visible, which is quite different from 1/f noise in standard MOSFETs. It is found that random telegraph noise is directly linked to Positive Bias Temperature Instability (PBTI): PBTI and RTN originate from the same physical process, charge trapping in the high-[Kappa] dielectric. The correlation between Id- and Ig-RTN is clearly observed. Ig-RTN is directly related to physical trapping or de-trapping and the Id-RTN reflects sensitivity to charge trapping as determined by gm. This dissertation has explored advanced TCAD simulations to overcome obstacles in low frequency noise and explained a comprehensive view and the underlying physics for low frequency noise in advanced CMOS technology.

Low-Frequency Noise in Advanced MOS Devices

Low-Frequency Noise in Advanced MOS Devices
Author: Martin von Haartman
Publisher: Springer
Total Pages: 216
Release: 2009-09-03
Genre: Technology & Engineering
ISBN: 9789048112753

This is an introduction to noise, describing fundamental noise sources and basic circuit analysis, discussing characterization of low-frequency noise and offering practical advice that bridges concepts of noise theory and modelling, characterization, CMOS technology and circuits. The text offers the latest research, reviewing the most recent publications and conference presentations. The book concludes with an introduction to noise in analog/RF circuits and describes how low-frequency noise can affect these circuits.

Low Power Circuit Design Using Advanced CMOS Technology

Low Power Circuit Design Using Advanced CMOS Technology
Author: Milin Zhang
Publisher: CRC Press
Total Pages: 776
Release: 2022-09-01
Genre: Science
ISBN: 1000791920

Low Power Circuit Design Using Advanced CMOS Technology is a summary of lectures from the first Advanced CMOS Technology Summer School (ACTS) 2017. The slides are selected from the handouts, while the text was edited according to the lecturers talk.ACTS is a joint activity supported by the IEEE Circuit and System Society (CASS) and the IEEE Solid-State Circuits Society (SSCS). The goal of the school is to provide society members as well researchers and engineers from industry the opportunity to learn about new emerging areas from leading experts in the field. ACTS is an example of high-level continuous education for junior engineers, teachers in academe, and students. ACTS was the results of a successful collaboration between societies, the local chapter leaders, and industry leaders. This summer school was the brainchild of Dr. Zhihua Wang, with strong support from volunteers from both the IEEE SSCS and CASS. In addition, the local companies, Synopsys China and Beijing IC Park, provided support.This first ACTS was held in the summer 2017 in Beijing. The lectures were given by academic researchers and industry experts, who presented each 6-hour long lectures on topics covering process technology, EDA skill, and circuit and layout design skills. The school was hosted and organized by the CASS Beijing Chapter, SSCS Beijing Chapter, and SSCS Tsinghua Student Chapter. The co-chairs of the first ACTS were Dr. Milin Zhang, Dr. Hanjun Jiang and Dr. Liyuan Liu. The first ACTS was a great success as illustrated by the many participants from all over China as well as by the publicity it has been received in various media outlets, including Xinhua News, one of the most popular news channels in China.

New Processes and Technologies to Reduce the Low-Frequency Noise of Digital and Analog Circuits

New Processes and Technologies to Reduce the Low-Frequency Noise of Digital and Analog Circuits
Author: Philippe Gaubert
Publisher:
Total Pages:
Release: 2016
Genre: Technology
ISBN:

The chapter is intended to provide the reader with means to reduce low-frequency noise in Metal-Oxide-Semiconductor Field-Effect-Transistor (MOSFET). It is demonstrated that low-resistivity source and drain electrodes can greatly lower the low-frequency noise level by suppressing their contribution to the total noise. Furthermore, new plasma processes having the advantages to work at low electron temperature can achieve a further reduction, thanks to the fabrication of a better gate oxide and to a reduction of damages generally induced by conventional plasma processes. Reducing the impact of the traps on the carrier flowing inside the channel by burying the channel can also achieve a reduction of the noise level, but unfortunately at the cost of a degradation of the electrical performances. Finally, the noise analysis of the low-frequency noise in accumulation-mode MOSFETs showed that these newly developed devices have a lower noise level than conventional structures, which, in addition to their superiority in term of electrical performances, establishes them as a serious platform for the next Complementary Metal-Oxide-Semiconductor Field-Effect-Transistor (CMOS) technology.

A New Architecture for Low-voltage Low-phase-noise High-frequency CMOS LC Voltage-controlled Oscillator

A New Architecture for Low-voltage Low-phase-noise High-frequency CMOS LC Voltage-controlled Oscillator
Author: Anthony Dac Lieu
Publisher:
Total Pages:
Release: 2005
Genre: Electric inductors
ISBN:

Presented in this work is a novel design technique for a low-phase-noise high-frequency CMOS voltage-controlled oscillator. Phase noise is generated from electrical noise near DC, the oscillation frequency, and its harmonics. In CMOS technology, low-frequency flicker noise dominates the close-in phase noise of the VCO. The proposed technique minimizes the VCO phase noise by seeking to eliminate the effect of flicker noise on the phase n6se. This is accomplished by canceling out the DC component of the impulse sensitivity function (ISF) corresponding to each flicker-noise source, thus preventing the up-conversion of low-frequency noise into phase noise. The proposed circuit topology is a modified version of the complementary cross-coupled transconductance VCO, where additional feedback paths are introduced such that a designer can choose the feedback ratios, transistor sizes, and bias voltages to achieve the previously mentioned design objectives. A step-by-step design algorithm is presented along with a MATLAB script to aid in the computation of the ISFs and the phase noise of the VCO. Using this algorithm, a 5-GHz VCO was designed and fabricated in a 0.18m︡ CMOS process, and then tested for comparison with simulated results.

Tradeoffs and Optimization in Analog CMOS Design

Tradeoffs and Optimization in Analog CMOS Design
Author: David Binkley
Publisher: John Wiley & Sons
Total Pages: 632
Release: 2008-09-15
Genre: Technology & Engineering
ISBN: 047003369X

Analog CMOS integrated circuits are in widespread use for communications, entertainment, multimedia, biomedical, and many other applications that interface with the physical world. Although analog CMOS design is greatly complicated by the design choices of drain current, channel width, and channel length present for every MOS device in a circuit, these design choices afford significant opportunities for optimizing circuit performance. This book addresses tradeoffs and optimization of device and circuit performance for selections of the drain current, inversion coefficient, and channel length, where channel width is implicitly considered. The inversion coefficient is used as a technology independent measure of MOS inversion that permits design freely in weak, moderate, and strong inversion. This book details the significant performance tradeoffs available in analog CMOS design and guides the designer towards optimum design by describing: An interpretation of MOS modeling for the analog designer, motivated by the EKV MOS model, using tabulated hand expressions and figures that give performance and tradeoffs for the design choices of drain current, inversion coefficient, and channel length; performance includes effective gate-source bias and drain-source saturation voltages, transconductance efficiency, transconductance distortion, normalized drain-source conductance, capacitances, gain and bandwidth measures, thermal and flicker noise, mismatch, and gate and drain leakage current Measured data that validates the inclusion of important small-geometry effects like velocity saturation, vertical-field mobility reduction, drain-induced barrier lowering, and inversion-level increases in gate-referred, flicker noise voltage In-depth treatment of moderate inversion, which offers low bias compliance voltages, high transconductance efficiency, and good immunity to velocity saturation effects for circuits designed in modern, low-voltage processes Fabricated design examples that include operational transconductance amplifiers optimized for various tradeoffs in DC and AC performance, and micropower, low-noise preamplifiers optimized for minimum thermal and flicker noise A design spreadsheet, available at the book web site, that facilitates rapid, optimum design of MOS devices and circuits Tradeoffs and Optimization in Analog CMOS Design is the first book dedicated to this important topic. It will help practicing analog circuit designers and advanced students of electrical engineering build design intuition, rapidly optimize circuit performance during initial design, and minimize trial-and-error circuit simulations.

Dielectric Films for Advanced Microelectronics

Dielectric Films for Advanced Microelectronics
Author: Mikhail Baklanov
Publisher: John Wiley & Sons
Total Pages: 508
Release: 2007-04-04
Genre: Technology & Engineering
ISBN: 0470065419

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.

Reliability Wearout Mechanisms in Advanced CMOS Technologies

Reliability Wearout Mechanisms in Advanced CMOS Technologies
Author: Alvin W. Strong
Publisher: John Wiley & Sons
Total Pages: 642
Release: 2009-10-13
Genre: Technology & Engineering
ISBN: 047045525X

This invaluable resource tells the complete story of failure mechanisms—from basic concepts to the tools necessary to conduct reliability tests and analyze the results. Both a text and a reference work for this important area of semiconductor technology, it assumes no reliability education or experience. It also offers the first reference book with all relevant physics, equations, and step-by-step procedures for CMOS technology reliability in one place. Practical appendices provide basic experimental procedures that include experiment design, performing stressing in the laboratory, data analysis, reliability projections, and interpreting projections.

5G and E-Band Communication Circuits in Deep-Scaled CMOS

5G and E-Band Communication Circuits in Deep-Scaled CMOS
Author: Marco Vigilante
Publisher: Springer
Total Pages: 211
Release: 2018-02-07
Genre: Technology & Engineering
ISBN: 3319726463

This book discusses design techniques, layout details and measurements of several key analog building blocks that currently limit the performance of 5G and E-Band transceivers implemented in deep-scaled CMOS. The authors present recent developments in low-noise quadrature VCOs and tunable inductor-less frequency dividers. Moreover, the design of low-loss broadband transformer-based filters that realize inter-stage matching, power division/combining and impedance transformation is discussed in great detail. The design and measurements of a low-noise amplifier, a downconverter and a highly-linear power amplifier that leverage the proposed techniques are shown. All the prototypes were realized in advanced nanometer scaled CMOS technologies without RF thick to metal option.