Laser Diagnostics And Photochemical Processing For Semiconductor Devices
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Author | : D. Bäuerle |
Publisher | : Springer Science & Business Media |
Total Pages | : 561 |
Release | : 2013-11-11 |
Genre | : Science |
ISBN | : 3642823815 |
Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.
Author | : R. M. Osgood |
Publisher | : North Holland |
Total Pages | : 356 |
Release | : 1983 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : Dieter Bäuerle |
Publisher | : Springer Science & Business Media |
Total Pages | : 253 |
Release | : 2013-03-09 |
Genre | : Science |
ISBN | : 3662025051 |
Materials processing with lasers is a rapidly expanding field which is increasingly captivating the attention of scientists, engineers and manufacturers alike. The aspect of most interest to scientists is provided by the basic interaction mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding medium. Engineers and manufacturers see in the laser a new tool which will not only make manufacturing cheaper, faster, cleaner and more accurate but which also opens up entirely new technologies and manufacturing methods that are simply not available using existing techniques. Actual and potential applications range from laser machining to laser-induced materials transformation, coating, patterning, etc. , opening up the prospect of exciting new processing methods for micromechanics, metallurgy, integrated optics, semiconductor manufacture and chemical engineering. This book concentrates on the new and interdisciplinary field of 1 aser-i nduced chemicaZ process i ng of materi als. The techni que permits maskless single-step deposition of thin films of metals, semiconductors or insulators with lateral dimensions ranging from a few tenths of a micrometer up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, nitridation, reduction, metallization and doping, are also possible within similar dimensions. This book is meant as an introduction. It attempts to cater for the very broad range of specific interests which different groups of readers will have, and this thinking underlies the way in which the material has been arranged.
Author | : Robert R. Alfano |
Publisher | : Elsevier |
Total Pages | : 576 |
Release | : 2012-12-02 |
Genre | : Science |
ISBN | : 0323145469 |
Semiconductors Probed by Ultrafast Laser Spectroscopy, Volume II discusses the use of ultrafast laser spectroscopy in studying fast physics in semiconductors. It reviews progress on the experimental and theoretical understanding of ultrafast events that occur on a picosecond and nanosecond time scale. This volume discusses electronic relaxation in amorphous semiconductors and the physical mechanisms during and after the interaction of an intense laser pulse with a semiconductor. It also covers the relaxation of carriers in semiconductors; transient optical pulse propagation; and methods of time-resolved spectroscopy. Scientists, engineers, and graduate students will find this book invaluable.
Author | : Dieter Bäuerle |
Publisher | : Springer Science & Business Media |
Total Pages | : 649 |
Release | : 2013-03-09 |
Genre | : Science |
ISBN | : 3662032538 |
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser--matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas--solid, liquid--solid, and solid--solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. Students, engineers, and manufacturers alike will find this book an invaluable reference work for the state of the art in laser processing.
Author | : R.A. Levy |
Publisher | : Springer Science & Business Media |
Total Pages | : 444 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 1461305411 |
As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics.
Author | : Hai-Lung Dai |
Publisher | : World Scientific |
Total Pages | : 819 |
Release | : 1995 |
Genre | : Science |
ISBN | : 981431725X |
Using lasers to induce and probe surface processes has the advantages of quantum state specificity, species selectivity, surface sensitivity, fast time-resolution, high frequency resolution, and accessibility to full pressure ranges. These advantages make it highly desirable to use light to induce, control, or monitor surface chemical and physical processes. Recent applications of laser based techniques in studying surface processes have stimulated new developments and enabled the understanding of fundamental problems in energy transfer and reactions. This volume will include discussions on spectroscopic techniques, energy transfer, desorption dynamics, and photochemistry.
Author | : R. C. Alkire |
Publisher | : |
Total Pages | : 308 |
Release | : 1993 |
Genre | : Science |
ISBN | : |
Author | : Daniel J. Ehrlich |
Publisher | : Elsevier |
Total Pages | : 602 |
Release | : 1989-06-21 |
Genre | : Technology & Engineering |
ISBN | : 0080918026 |
This book reviews the solid core of fundamental scientific knowledge on laser-stimulated surface chemistry that has accumulated over the past few years. It provides a useful overview for the student and interested non-expert as well as essential reference data (photodissociation cross sections, thermochemical constants, etc.) for the active researcher.
Author | : D.J. Ehrlich |
Publisher | : Springer Science & Business Media |
Total Pages | : 286 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9400914091 |
Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987