Laser Assisted Chemical Vapor Deposition Of Tungsten
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Laser Assisted Chemical Vapor Deposition of Tungsten
Author | : Augustinus Johannes Paulus van Maaren |
Publisher | : |
Total Pages | : 101 |
Release | : 1990 |
Genre | : |
ISBN | : |
Surface Processing and Laser Assisted Chemistry
Author | : E. Fogarassy |
Publisher | : Elsevier |
Total Pages | : 495 |
Release | : 1990-12-01 |
Genre | : Science |
ISBN | : 0444596682 |
The papers in this volume cover all aspects of laser assisted surface processing ranging from the preparation of high-Tc superconducting layer structures to industrial laser applications for device fabrication. The topics presented give recent results in organometallic chemistry and laser photochemistry, and novel surface characterization techniques. The ability to control the surface morphology by digital deposition and etching shows one of the future directions for exciting applications of laser surface processing, some of which may apply UV and VUV excitation. The understanding of elementary proceses is essential for the design of novel deposition methods, with diamond CVD being an outstanding example. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry.
The Chemistry of Metal CVD
Author | : Toivo T. Kodas |
Publisher | : John Wiley & Sons |
Total Pages | : 562 |
Release | : 2008-09-26 |
Genre | : Technology & Engineering |
ISBN | : 3527615849 |
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Author | : John E.J. Schmitz |
Publisher | : William Andrew |
Total Pages | : 264 |
Release | : 1992-12-31 |
Genre | : Computers |
ISBN | : |
Publisher description.
UV Laser-assisted Diamond Deposition
Author | : Mengxiao Wang |
Publisher | : |
Total Pages | : 100 |
Release | : 2014 |
Genre | : |
ISBN | : |
Diamond, due to its unique properties, has been studied for decades. Many diamond synthesis methods have been developed as well. As one of the synthesis methods, combustion flame chemical vapor deposition (CVD) is considered as the most flexible way. Combined with laser irradiation, laser-assisted combustion flame CVD can enhance the deposition process of diamond films. In this thesis work, efforts were made to explore the capability of a laser-assisted combustion flame CVD technique with krypton fluoride (KrF) excimer laser irradiation for improving diamond thin film quality and deposition rate. The research efforts mainly focus on following activities, including: 1) studying the influence of the gap distance between the inner flame and the substrates on crystallographic orientations, quality and deposition rate of the diamond film to determine the optimal parameters for the deposition; 2) conducting in-situ KrF excimer laser irradiation during the deposition process to increase the quality and the growth rate of the diamond film with the optimal deposition parameters, which includes excimer laser irradiation on the diamond film and on the combustion flame; 3) applying post-growth KrF excimer laser irradiation on diamond films, which is aiming to understand and verify the effect of KrF excimer laser irradiation on the diamond film during the deposition. A multi-torch combustion flame CVD was also developed for increasing the efficiency of depositing large-area diamond thin films. Diamond thin films have been deposited on tungsten carbide (WC) by the laser-assisted combustion-flame CVD technique in open atmosphere. A KrF excimer laser was used in the process to: 1) achieve energy coupling into combustion flame; 2) influence species proportions in the combustion flame; 3) promote seeding and nucleation process during diamond film deposition; 4) increase the diamond thin film quality and deposition rate through non-diamond carbon removal. Observations from experimental results confirmed that excimer laser irradiation could promote seeding and nucleation of diamond, growth rate and diamond quality. Furthermore, by changing the gap distance, the crystallographic orientations of diamond films can be controlled successfully and the optimal gap distance for diamond deposition can also be found. With applying a multi-torch setup in laser-assisted combustion flame CVD method, large-area diamond thin films were synthesized efficiently.