Laser Annealing Processes In Semiconductor Technology
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Author | : Fuccio Cristiano |
Publisher | : Woodhead Publishing |
Total Pages | : 428 |
Release | : 2021-04-21 |
Genre | : Technology & Engineering |
ISBN | : 0128202564 |
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Author | : J. M. Poate |
Publisher | : |
Total Pages | : 584 |
Release | : 1982 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : Ian W. Boyd |
Publisher | : Springer Science & Business Media |
Total Pages | : 328 |
Release | : 2013-03-08 |
Genre | : Science |
ISBN | : 3642831362 |
This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.
Author | : Lars Rebohle |
Publisher | : |
Total Pages | : 304 |
Release | : 2019 |
Genre | : Materials science |
ISBN | : 9783030233006 |
This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.
Author | : Xingsheng Liu |
Publisher | : Springer |
Total Pages | : 415 |
Release | : 2014-07-14 |
Genre | : Technology & Engineering |
ISBN | : 1461492637 |
This book introduces high power semiconductor laser packaging design. The challenges of the design and various packaging and testing techniques are detailed by the authors. New technologies and current applications are described in detail.
Author | : Cheol Seong Hwang |
Publisher | : Springer Science & Business Media |
Total Pages | : 266 |
Release | : 2013-10-18 |
Genre | : Science |
ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author | : F. Roozeboom |
Publisher | : The Electrochemical Society |
Total Pages | : 176 |
Release | : 2019-05-17 |
Genre | : Science |
ISBN | : 1607688689 |
This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.
Author | : F. Roozeboom |
Publisher | : The Electrochemical Society |
Total Pages | : 188 |
Release | : 2018-05-04 |
Genre | : Science |
ISBN | : 1607688344 |
Author | : Dongfang Yang |
Publisher | : BoD – Books on Demand |
Total Pages | : 224 |
Release | : 2023-03-29 |
Genre | : Technology & Engineering |
ISBN | : 1803564555 |
A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.
Author | : |
Publisher | : |
Total Pages | : 828 |
Release | : 1985 |
Genre | : Aeronautics |
ISBN | : |