Download Ion Bombardment Of Solids full books in PDF, epub, and Kindle. Read online free Ion Bombardment Of Solids ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
| Author | : Michael Nastasi |
| Publisher | : Cambridge University Press |
| Total Pages | : 572 |
| Release | : 1996-03-29 |
| Genre | : Science |
| ISBN | : 052137376X |
Comprehensive guide to an important materials science technique for students and researchers.
| Author | : Wolfgang Eckstein |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 303 |
| Release | : 2013-03-12 |
| Genre | : Science |
| ISBN | : 3642735134 |
In this book the author discusses the investigation of ion bombardment of solids by computer simulation, with the aim of demonstrating the usefulness of this approach to the problem of interactions of ions with solids. The various chapters present the basic physics behind the simulation programs, their structure and many applications to different topics. The two main streams, the binary collision model and the classical dynamics model, are discussed, as are interaction potentials and electronic energy losses. The main topics investigated are backscattering, sputtering and implantation for incident atomic particles with energies from the eV to the MeV range. An extensive overview of the literature is given, making this book of interest to the active reseacher as well to students entering the field.
| Author | : George Carter |
| Publisher | : |
| Total Pages | : 464 |
| Release | : 1968 |
| Genre | : Ion bombardment |
| ISBN | : |
| Author | : Rainer Behrisch |
| Publisher | : Springer |
| Total Pages | : 440 |
| Release | : 1991-09-10 |
| Genre | : Science |
| ISBN | : 9783540534280 |
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
| Author | : Hubert Gnaser |
| Publisher | : Springer |
| Total Pages | : 304 |
| Release | : 2014-01-15 |
| Genre | : |
| ISBN | : 9783662147382 |
| Author | : Sarah Fearn |
| Publisher | : Morgan & Claypool Publishers |
| Total Pages | : 67 |
| Release | : 2015-10-16 |
| Genre | : Technology & Engineering |
| ISBN | : 1681740885 |
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
| Author | : Kiyotaka Wasa |
| Publisher | : William Andrew |
| Total Pages | : 657 |
| Release | : 2012-12-31 |
| Genre | : Technology & Engineering |
| ISBN | : 1437734847 |
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
| Author | : Roger Smith |
| Publisher | : Cambridge University Press |
| Total Pages | : 323 |
| Release | : 1997-01-13 |
| Genre | : Science |
| ISBN | : 052144022X |
A 1997 monograph on simulation for condensed matter physicists, materials scientists, chemists and electrical engineers.
| Author | : Rainer Behrisch |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 527 |
| Release | : 2007-07-26 |
| Genre | : Technology & Engineering |
| ISBN | : 3540445021 |
This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
| Author | : J. S. Williams |
| Publisher | : Academic Press |
| Total Pages | : 432 |
| Release | : 2014-06-28 |
| Genre | : Technology & Engineering |
| ISBN | : 1483220648 |
Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
