Investigations Of Surface Interactions And Deposition Mechanisms In Plasma Enhanced Chemical Vapor Deposition Of Silicon Based Materials
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Author | : Patrick R. McCurdy |
Publisher | : |
Total Pages | : 384 |
Release | : 1999 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |
Author | : Pio Capezzuto |
Publisher | : Elsevier |
Total Pages | : 339 |
Release | : 1995-10-10 |
Genre | : Science |
ISBN | : 0080539106 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author | : Atul Gupta |
Publisher | : |
Total Pages | : 163 |
Release | : 2001 |
Genre | : |
ISBN | : |
Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Author | : H. P. Zhou |
Publisher | : |
Total Pages | : |
Release | : 2016 |
Genre | : Science |
ISBN | : |
High-quality and low-cost fabrication of Si-based materials, in which many fundamental and technology problems still remain, have attracted tremendous interests due to their wide applications in solar cell area. Low-frequency inductively coupled plasma (LFICP) provides a new and competitive solution, thanks to its inherent advantages of high-density plasma, low sheath potential, and low electron temperature, et cetera The plasma characteristic-dependent microstructures, optical and electronic properties of the LFICP CVD-based hydrogenated amorphous/microcrystalline silicon and silicon oxides are systematically studied. Remote-LFICP combing the high-density plasma nature of ICP and mild ion bombardment on growing surface in remote plasma allows the deposition of high-quality Si-based materials providing excellent c-Si surface passivation. The mechanism of surface passivation by LFICP CVD Si-based materials, interaction between plasma species and growing surface are analyzed in terms of the plasma properties. These results pave the way for LFICP CVD utilization in Si-based high-efficiency and low-cost solar cell fabrication.
Author | : Giovanni Bruno |
Publisher | : |
Total Pages | : 324 |
Release | : 1995 |
Genre | : Science |
ISBN | : 9780121379407 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author | : G. S. Mathad |
Publisher | : The Electrochemical Society |
Total Pages | : 388 |
Release | : 1998 |
Genre | : Technology & Engineering |
ISBN | : 9781566771832 |
Author | : |
Publisher | : |
Total Pages | : 654 |
Release | : 1993 |
Genre | : Power resources |
ISBN | : |
Author | : Arthur Sherman |
Publisher | : William Andrew |
Total Pages | : 240 |
Release | : 1987 |
Genre | : Computers |
ISBN | : |
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author | : |
Publisher | : |
Total Pages | : 884 |
Release | : 2006 |
Genre | : Dissertations, Academic |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : 1048 |
Release | : 1983 |
Genre | : Power resources |
ISBN | : |