Introduction to Focused Ion Beam Nanometrology

Introduction to Focused Ion Beam Nanometrology
Author: David C. Cox
Publisher: Morgan & Claypool Publishers
Total Pages: 119
Release: 2015-10-01
Genre: Technology & Engineering
ISBN: 1681741482

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Introduction to Focused Ion Beam Nanometrology

Introduction to Focused Ion Beam Nanometrology
Author: David Christopher Cox
Publisher:
Total Pages:
Release: 2015
Genre: TECHNOLOGY & ENGINEERING
ISBN: 9781681742120

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Introduction to Focused Ion Beam Nanometrology

Introduction to Focused Ion Beam Nanometrology
Author: David C. Cox
Publisher: Morgan & Claypool Publishers
Total Pages: 83
Release: 2015-10-01
Genre: Technology & Engineering
ISBN: 1681740842

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

Introduction to Focused Ion Beams

Introduction to Focused Ion Beams
Author: Lucille A. Giannuzzi
Publisher: Springer Science & Business Media
Total Pages: 362
Release: 2006-05-18
Genre: Science
ISBN: 038723313X

Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.

Focused Ion Beam Systems

Focused Ion Beam Systems
Author: Nan Yao
Publisher: Cambridge University Press
Total Pages: 496
Release: 2007-09-13
Genre: Technology & Engineering
ISBN: 1107320569

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

Nanofabrication Using Focused Ion and Electron Beams

Nanofabrication Using Focused Ion and Electron Beams
Author: Ivo Utke
Publisher: OUP USA
Total Pages: 831
Release: 2012-05
Genre: Science
ISBN: 0199734216

This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.

Focused Ion Beam Systems

Focused Ion Beam Systems
Author: Nan Yao
Publisher:
Total Pages: 395
Release: 2007
Genre: Focused ion beams
ISBN: 9781107316355

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

Fundamental Principles of Engineering Nanometrology

Fundamental Principles of Engineering Nanometrology
Author: Richard Leach
Publisher: Elsevier
Total Pages: 384
Release: 2014-05-17
Genre: Science
ISBN: 1455777501

Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. Richard Leach introduces these techniques to a broad audience of engineers and scientists involved in nanotechnology and manufacturing applications and research. He also provides a routemap and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale. Starting from the fundamentals of precision measurement, the author progresses into different measurement and characterization techniques. The focus on nanometrology in engineering contexts makes this book an essential guide for the emerging nanomanufacturing / nanofabrication sector, where measurement and standardization requirements are paramount both in product specification and quality assurance. This book provides engineers and scientists with the methods and understanding needed to design and produce high-performance, long-lived products while ensuring that compliance and public health requirements are met. Updated to cover new and emerging technologies, and recent developments in standards and regulatory frameworks, this second edition includes many new sections, e.g. new technologies in scanning probe and e-beam microscopy, recent developments in interferometry and advances in co-ordinate metrology. Demystifies nanometrology for a wide audience of engineers, scientists, and students involved in nanotech and advanced manufacturing applications and research Introduces metrologists to the specific techniques and equipment involved in measuring at the nano-scale or to nano-scale uncertainty Fully updated to cover the latest technological developments, standards, and regulations

Ion Beams in Nanoscience and Technology

Ion Beams in Nanoscience and Technology
Author: Ragnar Hellborg
Publisher: Springer Science & Business Media
Total Pages: 450
Release: 2009-11-09
Genre: Technology & Engineering
ISBN: 364200623X

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.