Encyclopedia of Interfacial Chemistry

Encyclopedia of Interfacial Chemistry
Author:
Publisher: Elsevier
Total Pages: 5276
Release: 2018-03-29
Genre: Science
ISBN: 0128098945

Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry, Seven Volume Set summarizes current, fundamental knowledge of interfacial chemistry, bringing readers the latest developments in the field. As the chemical and physical properties and processes at solid and liquid interfaces are the scientific basis of so many technologies which enhance our lives and create new opportunities, its important to highlight how these technologies enable the design and optimization of functional materials for heterogeneous and electro-catalysts in food production, pollution control, energy conversion and storage, medical applications requiring biocompatibility, drug delivery, and more. This book provides an interdisciplinary view that lies at the intersection of these fields. Presents fundamental knowledge of interfacial chemistry, surface science and electrochemistry and provides cutting-edge research from academics and practitioners across various fields and global regions

Functionalization of Semiconductor Surfaces

Functionalization of Semiconductor Surfaces
Author: Franklin Tao
Publisher: John Wiley & Sons
Total Pages: 456
Release: 2012-04-10
Genre: Technology & Engineering
ISBN: 0470562943

This book presents both fundamental knowledge and latest achievements of this rapidly growing field in the last decade. It presents a complete and concise picture of the the state-of-the-art in the field, encompassing the most active international research groups in the world. Led by contributions from leading global research groups, the book discusses the functionalization of semiconductor surface. Dry organic reactions in vacuum and wet organic chemistry in solution are two major categories of strategies for functionalization that will be described. The growth of multilayer-molecular architectures on the formed organic monolayers will be documented. The immobilization of biomolecules such as DNA on organic layers chemically attached to semiconductor surfaces will be introduced. The patterning of complex structures of organic layers and metallic nanoclusters toward sensing techniques will be presented as well.

Surface Treatment in Bonding Technology

Surface Treatment in Bonding Technology
Author: Anna Rudawska
Publisher: Academic Press
Total Pages: 292
Release: 2019-04-15
Genre: Technology & Engineering
ISBN: 0128170115

Surface Treatment in Bonding Technology provides valuable advice on surface treatment methods, modern measuring devices, and the appropriate experimentation techniques that are essential to create strong joints with a reliable service life. The book's focus is on the detailed and up-to-date analysis of surface treatment methods for metallic and polymer substrates. An analysis of factors affecting the surface preparation stage, together with advice on selection, is also provided. Essential theory is combined with experimentation techniques and industry practice to provide a guide that is both practical and academically rigorous. Including a general introduction to bonding, as well as coverage of mechanical, chemical and electrochemical methods, this book is the ideal primer for anyone working with or researching adhesive bonding. - Provides detailed descriptions of surface treatments and their mechanisms that will help readers build a deep understanding of these fundamental techniques - Includes a thorough survey of recent advances in research in surface treatments of metals and polymers - Provides technical advice on experimental testing methods throughout the book

C,H,N and O in Si and Characterization and Simulation of Materials and Processes

C,H,N and O in Si and Characterization and Simulation of Materials and Processes
Author: A. Borghesi
Publisher: North Holland
Total Pages: 624
Release: 1996
Genre: Science
ISBN:

Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.

Nanosilicon

Nanosilicon
Author: Vijay Kumar
Publisher: Elsevier
Total Pages: 385
Release: 2011-07-28
Genre: Technology & Engineering
ISBN: 0080549519

Properties of nanosilicon in the form of nanoparticles, nanowires, nanotubes, and as porous material are of great interest. They can be used in finding suitable components for future miniature devices, and for the more exciting possibilities of novel optoelectronic applications due to bright luminescence from porous silicon, nanoparticles and nanowires. New findings from research into metal encapsulated clusters, silicon fullerenes and nanotubes have opened up a new paradigm in nanosilicon research and this could lead to large scale production of nanoparticles with control on size and shape as well as novel quasi one-dimensional structures. There are possibilities of using silicon as an optical material and in the development of a silicon laser. In Nanosilicon, leading experts cover state-of-the-art experimental and theoretical advances in the different forms of nanosilicon. Furthermore, applications of nanosilicon to single electron transistors, as photonic material, chemical and biological sensors at molecular scale, and silicon nanowire devices are also discussed. Self-assemblies of silicon nanoforms are important for applications. These developments are also related to cage structures of silicon in clathrates. With an interesting focus on the bottlenecks in the advancement of silicon based technology, this book provides a much-needed overview of the current state of understanding of nanosilicon research. - Latest developments in nanoparticles, nanowires and nanotubes of silicon - Focus on nanosilicon - a very timely subject attracting large interest - Novel chapters on metal encapsulated silicon clusters and nanotubes

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies
Author: Markku Tilli
Publisher: Elsevier
Total Pages: 1028
Release: 2020-04-17
Genre: Technology & Engineering
ISBN: 012817787X

Handbook of Silicon Based MEMS Materials and Technologies, Third Edition is a comprehensive guide to MEMS materials, technologies, and manufacturing with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, modeling, manufacturing, processing, system integration, measurement, and materials characterization techniques of MEMS structures. The third edition of this book provides an important up-to-date overview of the current and emerging technologies in MEMS making it a key reference for MEMS professionals, engineers, and researchers alike, and at the same time an essential education material for undergraduate and graduate students. - Provides comprehensive overview of leading-edge MEMS manufacturing technologies through the supply chain from silicon ingot growth to device fabrication and integration with sensor/actuator controlling circuits - Explains the properties, manufacturing, processing, measuring and modeling methods of MEMS structures - Reviews the current and future options for hermetic encapsulation and introduces how to utilize wafer level packaging and 3D integration technologies for package cost reduction and performance improvements - Geared towards practical applications presenting several modern MEMS devices including inertial sensors, microphones, pressure sensors and micromirrors

Silicon Surfaces and Formation of Interfaces

Silicon Surfaces and Formation of Interfaces
Author: Jarek Dabrowski
Publisher: World Scientific
Total Pages: 580
Release: 2000
Genre: Science
ISBN: 9789810232863

Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references am numerous and organized in tables, allowing a search without the need to browse through the text. Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.