Catalytic Chemical Vapor Deposition

Catalytic Chemical Vapor Deposition
Author: Hideki Matsumura
Publisher: John Wiley & Sons
Total Pages: 438
Release: 2019-08-05
Genre: Technology & Engineering
ISBN: 352734523X

The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Tailored Optical Properties of Graphitic Carbon Nitride Thin Films Via Surface Functionalization of Growth Substrates

Tailored Optical Properties of Graphitic Carbon Nitride Thin Films Via Surface Functionalization of Growth Substrates
Author: Travis Tumlin
Publisher:
Total Pages: 59
Release: 2017
Genre:
ISBN:

Graphitic carbon nitride has attracted much attention in recent years due to its medium size band gap, mechanical strength, blue fluorescence, and catalysis properties. Mainstream methods to produce carbon nitride thin films rely on multi-step exfoliation processes and atmospheric deposition which is unsuitable for large-scale production of electronic devices and sensors where scaling and defect-free materials are required. Our technique utilizes a low-pressure chemical vapor deposition process that allows for one-step synthesis on many different types of substrates with a removal of unwanted reacting gases during synthesis due to the low-pressure environment. This allows us to deposit highly uniform films with thicknesses on the order of 250 nm. By modifying the growth surface chemistry, the band gap of the graphitic carbon nitride can be tuned from a medium gap of 2.87 eV up to 4.1 eV. The fluorescence emission can also be tuned from 425 nm up to 465 nm through growth substrate surface chemistry engineering. As a sensing material, our graphitic carbon nitride thin films have a limit of detection of 50 nM for metal copper ions which has great potential for applications where metal ion concentration is important to monitor such as in the human body.