High Resolution X Ray Scattering And Diffraction
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| Author | : Ullrich Pietsch |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 432 |
| Release | : 2004-08-27 |
| Genre | : Technology & Engineering |
| ISBN | : 9780387400921 |
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
| Author | : Mario Birkholz |
| Publisher | : John Wiley & Sons |
| Total Pages | : 378 |
| Release | : 2006-05-12 |
| Genre | : Technology & Engineering |
| ISBN | : 3527607048 |
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
| Author | : D.K. Bowen |
| Publisher | : CRC Press |
| Total Pages | : 263 |
| Release | : 1998-02-05 |
| Genre | : Technology & Engineering |
| ISBN | : 0203979192 |
The rapid growth in the applications of electronic materials has created an increasing demand for reliable techniques for examining and characterizing these materials. This book explores the area of x-ray diffraction and the techniques available for deployment in research, development, and production. It maps the theoretical and practical background necessary to study single crystal materials using high resolution x-ray diffraction and topography. It combines mathematical formalism with graphical explanations and hands-on advice for interpreting data, thus providing the theoretical and practical background for applying these techniques in scientific and industrial materials characterization
| Author | : Shih-Lin Chang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 458 |
| Release | : 2004-06-24 |
| Genre | : Science |
| ISBN | : 9783540211969 |
This comprehensive text describes the fundamentals of X-ray multiple-wave interaction in crystals and its applications in condensed matter physics and crystallography. It covers current theoretical approaches and application methods for many materials, including macromolecular crystals, thin films, semiconductors, quasicrystals and nonlinear optical materials. X-ray optics is also addressed. Designed primarily as a reference for researchers in condensed matter, crystallography, materials science, and synchrotron-related topics, the book will also be useful as a textbook for graduate and senior-year undergraduate courses on special topics in X-ray diffraction.
| Author | : Oliver H. Seeck |
| Publisher | : CRC Press |
| Total Pages | : 438 |
| Release | : 2015-02-10 |
| Genre | : Science |
| ISBN | : 9814303607 |
High-resolution x-ray diffraction and scattering is a key tool for structure analysis not only in bulk materials but also at surfaces and buried interfaces from the sub-nanometer range to micrometers. This book offers an overview of diffraction and scattering methods currently available at modern synchrotron sources and illustrates bulk and interface investigations of solid and liquid matter with up-to-date research examples. It presents important characteristics of the sources, experimental set-up, and new detector developments. The book also considers future exploitation of x-ray free electron lasers for diffraction applications.
| Author | : Ullrich Pietsch |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 410 |
| Release | : 2013-03-09 |
| Genre | : Technology & Engineering |
| ISBN | : 1475740506 |
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
| Author | : Eberhard J. Jaeschke |
| Publisher | : Springer |
| Total Pages | : 0 |
| Release | : 2016-05-27 |
| Genre | : Science |
| ISBN | : 9783319143934 |
Hardly any other discovery of the nineteenth century did have such an impact on science and technology as Wilhelm Conrad Röntgen’s seminal find of the X-rays. X-ray tubes soon made their way as excellent instruments for numerous applications in medicine, biology, materials science and testing, chemistry and public security. Developing new radiation sources with higher brilliance and much extended spectral range resulted in stunning developments like the electron synchrotron and electron storage ring and the freeelectron laser. This handbook highlights these developments in fifty chapters. The reader is given not only an inside view of exciting science areas but also of design concepts for the most advanced light sources. The theory of synchrotron radiation and of the freeelectron laser, design examples and the technology basis are presented. The handbook presents advanced concepts like seeding and harmonic generation, the booming field of Terahertz radiation sources and upcoming brilliant light sources driven by laser-plasma accelerators. The applications of the most advanced light sources and the advent of nanobeams and fully coherent x-rays allow experiments from which scientists in the past could not even dream. Examples are the diffraction with nanometer resolution, imaging with a full 3D reconstruction of the object from a diffraction pattern, measuring the disorder in liquids with high spatial and temporal resolution. The 20th century was dedicated to the development and improvement of synchrotron light sources with an ever ongoing increase of brilliance. With ultrahigh brilliance sources, the 21st century will be the century of x-ray lasers and their applications. Thus, we are already close to the dream of condensed matter and biophysics: imaging single (macro)molecules and measuring their dynamics on the femtosecond timescale to produce movies with atomic resolution.
| Author | : Andrei Benediktovich |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 325 |
| Release | : 2013-09-07 |
| Genre | : Technology & Engineering |
| ISBN | : 3642381774 |
This book provides a concise survey of modern theoretical concepts of X-ray materials analysis. The principle features of the book are: basics of X-ray scattering, interaction between X-rays and matter and new theoretical concepts of X-ray scattering. The various X-ray techniques are considered in detail: high-resolution X-ray diffraction, X-ray reflectivity, grazing-incidence small-angle X-ray scattering and X-ray residual stress analysis. All the theoretical methods presented use the unified physical approach. This makes the book especially useful for readers learning and performing data analysis with different techniques. The theory is applicable to studies of bulk materials of all kinds, including single crystals and polycrystals as well as to surface studies under grazing incidence. The book appeals to researchers and graduate students alike.
| Author | : Paul F. Fewster |
| Publisher | : World Scientific |
| Total Pages | : 303 |
| Release | : 2000 |
| Genre | : Science |
| ISBN | : 1860941591 |
X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, and more.
| Author | : Emil Zolotoyabko |
| Publisher | : John Wiley & Sons |
| Total Pages | : 299 |
| Release | : 2014-02-10 |
| Genre | : Science |
| ISBN | : 3527681183 |
Authored by a university professor deeply involved in X-ray diffraction-related research, this textbook is based on his lectures given to graduate students for more than 20 years. It adopts a well-balanced approach, describing basic concepts and experimental techniques, which make X-ray diffraction an unsurpassed method for studying the structure of materials. Both dynamical and kinematic X-ray diffraction is considered from a unified viewpoint, in which the dynamical diffraction in single-scattering approximation serves as a bridge between these two parts. The text emphasizes the fundamental laws that govern the interaction of X-rays with matter, but also covers in detail classical and modern applications, e.g., line broadening, texture and strain/stress analyses, X-ray mapping in reciprocal space, high-resolution X-ray diffraction in the spatial and wave vector domains, X-ray focusing, inelastic and time-resolved X-ray scattering. This unique scope, in combination with otherwise hard-to-find information on analytic expressions for simulating X-ray diffraction profiles in thin-film heterostructures, X-ray interaction with phonons, coherent scattering of Mossbauer radiation, and energy-variable X-ray diffraction, makes the book indispensable for any serious user of X-ray diffraction techniques. Compact and self-contained, this textbook is suitable for students taking X-ray diffraction courses towards specialization in materials science, physics, chemistry, or biology. Numerous clear-cut illustrations, an easy-to-read style of writing, as well as rather short, easily digestible chapters all facilitate comprehension.
