The Stopping and Ranges of Ions in Matter

The Stopping and Ranges of Ions in Matter
Author: J. F. Ziegler
Publisher: Elsevier
Total Pages: 437
Release: 2013-09-11
Genre: Science
ISBN: 1483148203

Stopping Cross-Sections for Energetic Ions in All Elements shows the stopping cross-sections of energetic ions in various elements in both solid and gas phase targets. The book plots chosen ion and target combinations to allow accurate linear interpolation between plots for all elemental ions and all elemental targets (atomic number 1 through 92). Existing stopping data and summaries of the experimental data are presented as well. Chapters are also devoted to electronic and nuclear stopping of ions. Physicists, researchers, physicians, nuclear scientists, radiologists, and engineers will find the book a good reference material.

Handbook of Ion Sources

Handbook of Ion Sources
Author: Bernhard Wolf
Publisher: CRC Press
Total Pages: 558
Release: 2017-07-12
Genre: Technology & Engineering
ISBN: 1351829947

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Particle Penetration and Radiation Effects Volume 2

Particle Penetration and Radiation Effects Volume 2
Author: Peter Sigmund
Publisher: Springer
Total Pages: 617
Release: 2014-05-29
Genre: Science
ISBN: 331905564X

This book represents volume 2 of a 3-volume monograph on Particle Penetration and Radiation Effects. While volume 1 addressed the basic theory of scattering and stopping of swift point charges, i.e., protons, antiprotons and alpha particles, the present volume focuses on ions heavier than helium as well as molecules and clusters over an energy range from a few keV/u to a few hundred MeV/u. The book addresses the foundations in atomic-collision physics of a wide variety of application areas within materials and surface science and engineering, micro and nano science and technology, radiation medicine and biology as well as nuclear and particle physics. Problems have been added to all chapters. This should make the book useful for both self-study and advanced university courses. An effort has been made to establish a unified notation throughout the monograph.

Ion Implantation Techniques

Ion Implantation Techniques
Author: H. Ryssel
Publisher: Springer Science & Business Media
Total Pages: 377
Release: 2012-12-06
Genre: Science
ISBN: 3642687792

In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.

Handbook of Surface and Interface Analysis

Handbook of Surface and Interface Analysis
Author: John C. Riviere
Publisher: CRC Press
Total Pages: 1006
Release: 1998-01-27
Genre: Science
ISBN: 9780824700805

Integrating advances in instrumentation and methods, this work offers an approach to solving problems in surface and interface analysis, beginning with a particular problem and then explaining the most rational and efficient route to a solution. The book discusses electron optical and scanned probe microscopy, high spatial resolution imaging and synchrotron-based techniques. It emphasizes problem-solving for different classes of materials and material function.