Handbook Of Photomask Manufacturing Technology
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| Author | : Syed Rizvi |
| Publisher | : CRC Press |
| Total Pages | : 728 |
| Release | : 2018-10-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1420028782 |
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
| Author | : Yoshio Nishi |
| Publisher | : CRC Press |
| Total Pages | : 1720 |
| Release | : 2017-12-19 |
| Genre | : Technology & Engineering |
| ISBN | : 1420017667 |
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
| Author | : Benjamin G. Eynon |
| Publisher | : McGraw Hill Professional |
| Total Pages | : 589 |
| Release | : 2005-08-11 |
| Genre | : Technology & Engineering |
| ISBN | : 0071588914 |
Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.
| Author | : Charles J. Alpert |
| Publisher | : CRC Press |
| Total Pages | : 1024 |
| Release | : 2008-11-12 |
| Genre | : Computers |
| ISBN | : 1420013483 |
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
| Author | : Luciano Lavagno |
| Publisher | : CRC Press |
| Total Pages | : 762 |
| Release | : 2018-10-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1351837583 |
Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
| Author | : J. T. Black |
| Publisher | : John Wiley & Sons |
| Total Pages | : 1298 |
| Release | : 2011-08-30 |
| Genre | : Political Science |
| ISBN | : 0470924675 |
Now in its eleventh edition, DeGarmo's Materials and Processes in Manufacturing has been a market-leading text on manufacturing and manufacturing processes courses for more than fifty years. Authors J T. Black and Ron Kohser have continued this book's long and distinguished tradition of exceedingly clear presentation and highly practical approach to materials and processes, presenting mathematical models and analytical equations only when they enhance the basic understanding of the material. Completely revised and updated to reflect all current practices, standards, and materials, the eleventh edition has new coverage of additive manufacturing, lean engineering, and processes related to ceramics, polymers, and plastics.
| Author | : Luciano Lavagno |
| Publisher | : CRC Press |
| Total Pages | : 893 |
| Release | : 2017-02-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1351831003 |
The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
| Author | : Jun Taniguchi |
| Publisher | : John Wiley & Sons |
| Total Pages | : 306 |
| Release | : 2013-06-13 |
| Genre | : Technology & Engineering |
| ISBN | : 1118535065 |
Nanoscale pattern transfer technology using molds is a rapidly advancing area and one that has seen much recent attention due to its potential for use in nanotechnology industries and applications. However, because of these rapid advances, it can be difficult to keep up with the technological trends and the latest cutting-edge methods. In order to fully understand these pioneering technologies, a comprehensive understanding of the basic science and an overview of the techniques are required. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers covers the latest nanotransfer science based on polymer behaviour. Polymer fluid dynamics are described in detail, and injection moulding, nanoimprint lithography and micro contact printing are also discussed. Cutting-edge nanotransfer technologies and applications are also considered and future trends in industry are examined. Key features: • Covers the fundamentals of nanoimprint technology • Presents cutting-edge techniques and applications • Provides industrial examples and describes the mold fabrication process • Considers nanotransfer of thermoplastics by simulation • Describes the design and evaluation of UV curable polymer Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers is a comprehensive reference for industry engineers as well as graduate and undergraduate students, and is a useful source of information for anyone looking to improve their understanding of nanotransfer mechanisms and methods.
| Author | : M Feldman |
| Publisher | : Woodhead Publishing |
| Total Pages | : 599 |
| Release | : 2014-02-13 |
| Genre | : Technology & Engineering |
| ISBN | : 0857098756 |
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
| Author | : Yangyuan Wang |
| Publisher | : Springer Nature |
| Total Pages | : 2006 |
| Release | : 2023-12-29 |
| Genre | : Technology & Engineering |
| ISBN | : 9819928362 |
Written by hundreds experts who have made contributions to both enterprise and academics research, these excellent reference books provide all necessary knowledge of the whole industrial chain of integrated circuits, and cover topics related to the technology evolution trends, fabrication, applications, new materials, equipment, economy, investment, and industrial developments of integrated circuits. Especially, the coverage is broad in scope and deep enough for all kind of readers being interested in integrated circuit industry. Remarkable data collection, update marketing evaluation, enough working knowledge of integrated circuit fabrication, clear and accessible category of integrated circuit products, and good equipment insight explanation, etc. can make general readers build up a clear overview about the whole integrated circuit industry. This encyclopedia is designed as a reference book for scientists and engineers actively involved in integrated circuit research and development field. In addition, this book provides enough guide lines and knowledges to benefit enterprisers being interested in integrated circuit industry.
