Handbook Of Advanced Plasma Processing Techniques
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Author | : R.J. Shul |
Publisher | : Springer Science & Business Media |
Total Pages | : 664 |
Release | : 2011-06-28 |
Genre | : Technology & Engineering |
ISBN | : 3642569897 |
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author | : Stephen M. Rossnagel |
Publisher | : William Andrew |
Total Pages | : 523 |
Release | : 1990 |
Genre | : Reference |
ISBN | : 9780815512202 |
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Author | : Arthur H Landrock |
Publisher | : William Andrew |
Total Pages | : 523 |
Release | : 1990 |
Genre | : |
ISBN | : |
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Author | : Riccardo d'Agostino |
Publisher | : John Wiley & Sons |
Total Pages | : 479 |
Release | : 2008-09-08 |
Genre | : Science |
ISBN | : 3527622195 |
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.
Author | : Reza Ghodssi |
Publisher | : Springer Science & Business Media |
Total Pages | : 1211 |
Release | : 2011-03-18 |
Genre | : Technology & Engineering |
ISBN | : 0387473181 |
MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.
Author | : National Research Council |
Publisher | : National Academies Press |
Total Pages | : 88 |
Release | : 1991-02-01 |
Genre | : Technology & Engineering |
ISBN | : 0309045975 |
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author | : Bonnie A. Osif |
Publisher | : CRC Press |
Total Pages | : 548 |
Release | : 2016-04-19 |
Genre | : Language Arts & Disciplines |
ISBN | : 1439850038 |
With the encroachment of the Internet into nearly all aspects of work and life, it seems as though information is everywhere. However, there is information and then there is correct, appropriate, and timely information. While we might love being able to turn to Wikipedia for encyclopedia-like information or search Google for the thousands of links
Author | : Mikhail Baklanov |
Publisher | : John Wiley & Sons |
Total Pages | : 616 |
Release | : 2012-04-02 |
Genre | : Technology & Engineering |
ISBN | : 0470662549 |
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Author | : Hubert Rauscher |
Publisher | : John Wiley & Sons |
Total Pages | : 428 |
Release | : 2010-04-16 |
Genre | : Technology & Engineering |
ISBN | : 9783527630462 |
Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes.
Author | : Shiban Tiku |
Publisher | : CRC Press |
Total Pages | : 706 |
Release | : 2016-04-27 |
Genre | : Science |
ISBN | : 9814669318 |
GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III-V processing, with emphasis on HBTs. It is aimed at practicing