Future Directions In Thin Film Science And Technology
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| Author | : J M Marshall |
| Publisher | : World Scientific |
| Total Pages | : 618 |
| Release | : 1997-09-05 |
| Genre | : |
| ISBN | : 9814546267 |
There is a major international interest in thin film materials and devices, Future Directions in Thin Film Science and Technology stimulated by important current and projected applications in many areas of information technology and other fields, constitutes the proceedings of the Ninth International School on Condensed Matter Physics. It features invited review articles by over 40 scientists of international repute, covering many aspects of thin film science and technology. Also included is a broad selection of shorter contributed papers by other participants, describing results of their recent research.The book will be of interest to postgraduate students and established scientists involved in the fabrication, characterisation, and applications of thin film materials and devices. The invited reviews will also be of value to final year undergraduates in physics, materials science, and electronic engineering studying many areas of contemporary solid state technology.
| Author | : J M Marshall |
| Publisher | : World Scientific |
| Total Pages | : 582 |
| Release | : 1999-06-01 |
| Genre | : |
| ISBN | : 9814543705 |
This volume constitutes the proceedings of the tenth meeting of the International school on Condensed Matter Physics. Since 1980, this community of condensed matter scientists has gathered in Varna, Bulgaria, every two years, to review and discuss the development of various investigations in the field, to present the latest results, and to outline the most important trends in condensed matter science.The book reflects the development of the field, and points to the growing interest in the application of theoretical achievements and to the mutual inspirations of science and technology.
| Author | : Peter M. Martin |
| Publisher | : William Andrew |
| Total Pages | : 932 |
| Release | : 2009-12-01 |
| Genre | : Technology & Engineering |
| ISBN | : 0815520328 |
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
| Author | : B. M. Caruta |
| Publisher | : Nova Publishers |
| Total Pages | : 240 |
| Release | : 2005 |
| Genre | : Science |
| ISBN | : 9781594545177 |
The broad field of thin film technology is based first of all on the film growth processes in general. The concepts of crystal structure and defects in crystalline thin films such as grain boundaries, dislocations and vacancies are examined. The general nature of film growth from atoms equilibrating with the service, through the initial stages of growth to film coalescence and zone models is also within the scope of this book as are evaporation, sputter deposition and chemical vapour deposition. Thin films are widely used in microelectronics, chemistry and a wide array of related fields. This book offers new research in this exploding field.
| Author | : Kash L. Mittal |
| Publisher | : CRC Press |
| Total Pages | : 279 |
| Release | : 2014-07-30 |
| Genre | : Science |
| ISBN | : 1466562242 |
This book chronicles the proceedings of the First International Symposium on Adhesion Aspects of Thin Films, held in Newark, New Jersey, October 28-29, 1999. Films and coatings are used for a variety of purposes a decorative, protective, functional, etc. a in a host of applications. Irrespective of the intended function or application of a film
| Author | : K. L. Mittal |
| Publisher | : VSP |
| Total Pages | : 288 |
| Release | : 2001-04-03 |
| Genre | : Science |
| ISBN | : 9789067643382 |
This book chronicles the proceedings of the First International Symposium on Adhesion Aspects of Thin Films, held in Newark, New Jersey, October 28-29, 1999. Films and coatings are used for a variety of purposes – decorative, protective, functional, etc. – in a host of applications. Irrespective of the intended function or application of a film or a coating, their adequate adhesion to the underlying substrates is of cardinal importance. Concomitantly, the need to understand the factors controlling adhesion and to tailor adhesion to a desired level is quite patent. This book contains a total of 16 papers, which were presented by researchers from academia, industry and other laboratories, and have been rigorously peer reviewed, suitably revised and properly edited before inclusion. The topics covered include: mechanisms, origin, evolution and measurement of stresses in thin films; surface stress effects on the intrinsic stress; various factors affecting stresses in thin films; delamination of coatings caused by residual stress; effects of surface treatments on the adhesion of metallic films; adhesion of CVD diamond to carbide cutting inserts; effect of carbon contaminant on adhesion of aluminum films; effect of interlayers on adhesion of ceramic coatings; effect of residual stress on adhesion and wear resistance of hard coatings; tribological properties of ceramic films; oxide layers as barrier coatings on a plastic substrate; adhesion aspects of organic coatings to metals; and adhesion of thin plasma polymerized fluorocarbon films.This book, providing a commentary on the current state of knowledge of adhesion of thin films, will be useful to anyone interested in thin films and will provide ideas on how to improve or tailor adhesion of a film or a coating for a given situation.
| Author | : Jai Singh |
| Publisher | : CRC Press |
| Total Pages | : 340 |
| Release | : 2003-04-10 |
| Genre | : Technology & Engineering |
| ISBN | : 9781420023848 |
Amorphous materials differ significantly from their crystalline counterparts in several ways that create unique issues in their use. This book explores these issues and their implications, and provides a full treatment of both experimental and theoretical studies in the field. Advances in Amorphous Semiconductors covers a wide range of studies on hydrogenated amorphous silicon, amorphous chalcogenides, and some oxide glasses. It reviews structural properties, properties associated with the charge carrier-phonon interaction, defects, electronic transport, photoconductivity, and some applications of amorphous semiconductors. The book explains a number of recent advances in semiconductor research, including some of the editors' own findings. It addresses some of the problems associated with the validity of the effective mass approximation, whether K is a good quantum number, and the concepts of phonons and excitons. It also discusses recent progress made in understanding light-induced degradations in amorphous semiconductors, which is seen as the most limiting problem in device applications. The book presents a comprehensive review of both experimental and theoretical studies on amorphous semiconductors, which will be useful to students, researchers, and instructors in the field of amorphous solids.
| Author | : United States. Congress. House. Committee on Science. Subcommittee on Energy |
| Publisher | : |
| Total Pages | : 96 |
| Release | : 2006 |
| Genre | : Business & Economics |
| ISBN | : |
| Author | : John Venables |
| Publisher | : Cambridge University Press |
| Total Pages | : 392 |
| Release | : 2000-08-31 |
| Genre | : Science |
| ISBN | : 9780521785006 |
This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.
| Author | : Peter Rodgers |
| Publisher | : World Scientific |
| Total Pages | : 367 |
| Release | : 2009-08-21 |
| Genre | : Technology & Engineering |
| ISBN | : 9814466867 |
This book contains 35 review articles on nanoscience and nanotechnology that were first published in Nature Nanotechnology, Nature Materials and a number of other Nature journals. The articles are all written by leading authorities in their field and cover a wide range of areas in nanoscience and technology, from basic research (such as single-molecule devices and new materials) through to applications (in, for example, nanomedicine and data storage).
