Fabrication Of A Focused Beam System
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Focused Ion Beam Systems
Author | : Nan Yao |
Publisher | : Cambridge University Press |
Total Pages | : 496 |
Release | : 2007-09-13 |
Genre | : Technology & Engineering |
ISBN | : 1107320569 |
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Focused Ion Beam Systems
Author | : Nan Yao |
Publisher | : Cambridge University Press |
Total Pages | : 0 |
Release | : 2011-04-14 |
Genre | : Technology & Engineering |
ISBN | : 9780521158596 |
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
The Physics of Micro/Nano-Fabrication
Author | : Ivor Brodie |
Publisher | : Springer Science & Business Media |
Total Pages | : 661 |
Release | : 2013-06-29 |
Genre | : Science |
ISBN | : 1475767757 |
In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Nanofabrication Using Focused Ion and Electron Beams
Author | : Ivo Utke |
Publisher | : OUP USA |
Total Pages | : 830 |
Release | : 2012-05 |
Genre | : Technology & Engineering |
ISBN | : 0199734216 |
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Modelling of Microfabrication Systems
Author | : Raja Nassar |
Publisher | : Springer Science & Business Media |
Total Pages | : 276 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 3662087928 |
This is the first book to address modelling of systems that are important to the fabrication of three-dimensional microstructures. It is unique in that it focuses on high aspect ratio microtechnology, ranging from ion beam micromachining to x-ray lithography.
Electron-Beam Technology in Microelectronic Fabrication
Author | : George Brewer |
Publisher | : Elsevier |
Total Pages | : 377 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 0323153410 |
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.