Fabrication and Optimization of Microwave Plasma Assisted Chemical Vapor Deposition System for Growing Diamond Films
Author | : Zhenqing Xu |
Publisher | : |
Total Pages | : 198 |
Release | : 2003 |
Genre | : Chemical vapor deposition |
ISBN | : |
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Author | : Zhenqing Xu |
Publisher | : |
Total Pages | : 198 |
Release | : 2003 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Wen-Shin Huang |
Publisher | : |
Total Pages | : 798 |
Release | : 2004 |
Genre | : Chemical vapor |
ISBN | : |
Author | : Dzung Tri Tran |
Publisher | : |
Total Pages | : 314 |
Release | : 2005 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Gregory P. Vierkant |
Publisher | : |
Total Pages | : 212 |
Release | : 2006 |
Genre | : Diamond thin films |
ISBN | : |
Author | : Andrew Israel |
Publisher | : |
Total Pages | : 110 |
Release | : 1998 |
Genre | : Crystal growth |
ISBN | : |
Author | : Koji Kobashi |
Publisher | : Elsevier |
Total Pages | : 350 |
Release | : 2010-07-07 |
Genre | : Science |
ISBN | : 0080525571 |
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Author | : Kamleshwar Upadhya |
Publisher | : |
Total Pages | : 400 |
Release | : 1991 |
Genre | : Finishes and finishing |
ISBN | : |
The principal purpose of the conference on which this book was based was to provide a state of the art review of plasma assisted PVD, PACVD and laser enhanced CVD processes through papers dealing with basic fundamentals of plasma and laser assisted technology and also in depth papers related to continuing research on synthesis of metastable compounds.