Electron Microscopy 1988
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| Author | : David G. Rickerby |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 503 |
| Release | : 2012-12-06 |
| Genre | : Technology & Engineering |
| ISBN | : 9401144516 |
The Advanced Study Institute provided an opportunity for researchers in universities, industry and National and International Laboratories, from the disciplines ofmaterials science, physics, chemistry and engineering to meet together in an assessment of the impact of electron and scanning probe microscopy on advanced material research. Since these researchers have traditionally relied upon different approaches, due to their different scientific background, to advanced materials problem solving, presentations and discussion within the Institute sessions were initially devoted to developing a set ofmutually understood basic concepts, inherently related to different techniques ofcharacterization by microscopy and spectroscopy. Particular importance was placed on Electron Energy Loss Spectroscopy (EELS), Scanning Probe Microscopy (SPM), High Resolution Transmission and Scanning Electron Microscopy (HRTEM, HRSTEM) and Environmental Scanning Electron Microscopy (ESEM). It was recognized that the electronic structure derived directly from EELS analysis as well as from atomic positions in HRTEM or High Angle Annular Dark Field STEM can be used to understand the macroscopic behaviour of materials. The emphasis, however, was upon the analysis of the electronic band structure of grain boundaries, fundamental for the understanding of macroscopic quantities such as strength, cohesion, plasticity, etc.
| Author | : |
| Publisher | : Academic Press |
| Total Pages | : 919 |
| Release | : 1996-08-05 |
| Genre | : Science |
| ISBN | : 0080577628 |
As a complement to The Beginnings of Electron Microscopy, Advances in Imaging and Electron Physics is pleased to present Volume 96, The Growth of Electron Microscopy. This comprehensive collection of articles surveys the accomplishments of various national groups that comprise the International Federation of Societies of Electron Microscopy (IFSEM).
| Author | : Ernst Ruska |
| Publisher | : |
| Total Pages | : 162 |
| Release | : 1980 |
| Genre | : Electromagnetic lenses |
| ISBN | : |
| Author | : Stephen J. Pennycook |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 764 |
| Release | : 2011-03-24 |
| Genre | : Technology & Engineering |
| ISBN | : 1441972005 |
Scanning transmission electron microscopy has become a mainstream technique for imaging and analysis at atomic resolution and sensitivity, and the authors of this book are widely credited with bringing the field to its present popularity. Scanning Transmission Electron Microscopy(STEM): Imaging and Analysis will provide a comprehensive explanation of the theory and practice of STEM from introductory to advanced levels, covering the instrument, image formation and scattering theory, and definition and measurement of resolution for both imaging and analysis. The authors will present examples of the use of combined imaging and spectroscopy for solving materials problems in a variety of fields, including condensed matter physics, materials science, catalysis, biology, and nanoscience. Therefore this will be a comprehensive reference for those working in applied fields wishing to use the technique, for graduate students learning microscopy for the first time, and for specialists in other fields of microscopy.
| Author | : |
| Publisher | : Academic Press |
| Total Pages | : 562 |
| Release | : 2008-10-22 |
| Genre | : Science |
| ISBN | : 008088816X |
This volume demonstrates how cellular and associated electron microscopy contributes to knowledge about biological structural information, primarily at the nanometer level. It presents how EM approaches complement both conventional structural biology (at the high end, angstrom level of resolution) and digital light microscopy (at the low end, 100-200 nanometers). Basic techniques in transmission and scanning electron microscopy Detailed chapters on how to use electron microscopy when dealing with specific cellular structures, such as the nucleus, cell membrane, and cytoskeleton Discussion on electron microscopy of viruses and virus-cell interactions
| Author | : P.W. Hawkes |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 1336 |
| Release | : 2008-08-29 |
| Genre | : Technology & Engineering |
| ISBN | : 0387497625 |
This fully corrected second impression of the classic 2006 text on microscopy runs to more than 1,000 pages and covers up-to-the-minute developments in the field. The two-volume work brings together a slew of experts who present comprehensive reviews of all the latest instruments and new versions of the older ones, as well as their associated operational techniques. The chapters draw attention to their principal areas of application. A huge range of subjects are benefiting from these new tools, including semiconductor physics, medicine, molecular biology, the nanoworld in general, magnetism, and ferroelectricity. This fascinating book will be an indispensable guide for a wide range of scientists in university laboratories as well as engineers and scientists in industrial R&D departments.
| Author | : P.K. Larsen |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 526 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 146845580X |
This volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography going back to the discovery of electron diffraction in 1927 by Davisson and Germer. Until the development of ultra high vacuum techniques in the 1960's made instruments using slow electrons more accessable, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazing angle geometry of RHEED has now become a very useful feature because this makes it ideally suited for combination with the thin growth technique of Molecular Beam Epitaxy (MBE). This combination allows in-situ studies of freshly grown and even growing surfaces, opening up new areas of research of both fundamental and technological importance.
| Author | : |
| Publisher | : Academic Press |
| Total Pages | : 357 |
| Release | : 1991-12-02 |
| Genre | : Computers |
| ISBN | : 0080577474 |
Advances in Electronics and Electron Physics
| Author | : Peter W. Hawkes |
| Publisher | : Elsevier |
| Total Pages | : 729 |
| Release | : 2017-10-29 |
| Genre | : Science |
| ISBN | : 0081022573 |
Volume one of Principles of Electron Optics: Basic Geometrical Optics, Second Edition, explores the geometrical optics needed to analyze an extremely wide range of instruments: cathode-ray tubes; the family of electron microscopes, including the fixed-beam and scanning transmission instruments, the scanning electron microscope and the emission microscope; electron spectrometers and mass spectrograph; image converters; electron interferometers and diffraction devices; electron welding machines; and electron-beam lithography devices. The book provides a self-contained, detailed, modern account of electron optics for anyone involved with particle beams of modest current density in the energy range up to a few mega-electronvolts. You will find all the basic equations with their derivations, recent ideas concerning aberration studies, extensive discussion of the numerical methods needed to calculate the properties of specific systems and guidance to the literature of all the topics covered. A continuation of these topics can be found in volume two, Principles of Electron Optics: Applied Geometrical Optics. The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography. - Offers a fully revised and expanded new edition based on the latest research developments in electron optics - Written by the top experts in the field - Covers every significant advance in electron optics since the subject originated - Contains exceptionally complete and carefully selected references and notes - Serves both as a reference and text
| Author | : David Cherns |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 413 |
| Release | : 2012-12-06 |
| Genre | : Medical |
| ISBN | : 1461305276 |
The last few years have ~een rapid improvements in semiconductor growth techniques which have produced an expanding range of high quality heterostructures for new semiconductor devises. As the dimensions of such structures approach the nanometer level, it becomes increasingly important to characterise materials properties such as composition uniformity, strain, interface sharpness and roughness and the nature of defects, as well as their influence on electrical and optical properties. Much of this information is being obtained by electron microscopy and this is also an area of rapid progress. There have been advances for thin film studies across a wide range of techniques, including, for example, convergent beam electron diffraction, X-ray and electron energy loss microanalysis and high spatial resolution cathodoluminescence as well as by conventional and high resolution methods. Important develop ments have also occurred in the study of surfaces and film growth phenomena by both microscopy and diffraction techniques. With these developments in mind, an application was made to the NATO Science Committee in late summer 1987 to fund an Advanced Research Work shop to review the electron microscopy of advanced semiconductors. This was subsequently accepted for the 1988 programme and became the "NATO Advanced Research Workshop on the Evaluation of Advanced Semiconductor Materials by Electron Microscopy". The Workshop took place in the pleasant and intimate surroundings of Wills Hall, Bristol, UK, during the week 11-17 September 1988 and was attended by fifty-five participants from fourteen countries.
