Deposition And Characterization Of Hydrogenated Amorphous Silicon Microcrystalline Silicon And Silicon Based Alloy Thin Films
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Hydrogenated Amorphous Silicon Alloy Deposition Processes
Author | : Werner Luft |
Publisher | : CRC Press |
Total Pages | : 344 |
Release | : 1993-05-24 |
Genre | : Science |
ISBN | : 9780824791469 |
This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
Plasma Deposition of Amorphous Silicon-Based Materials
Author | : Pio Capezzuto |
Publisher | : Elsevier |
Total Pages | : 339 |
Release | : 1995-10-10 |
Genre | : Science |
ISBN | : 0080539106 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Amorphous and Microcrystalline Silicon Technology - 1997: Volume 467
Author | : Michael Hack |
Publisher | : Materials Research Society |
Total Pages | : 0 |
Release | : 1997-12-03 |
Genre | : Technology & Engineering |
ISBN | : 9781558993716 |
While the original focus of this long-standing series from the Materials Research Society was on hydrogenated amorphous silicon, the symposia have now expanded to incorporate microcrystalline silicon. The two, in fact, are very closely connected since the latter material can be grown by making comparatively small changes to the deposition conditions for amorphous silicon. This book offers an interesting variety of papers on deposition techniques, materials properties, characterization methods and devices - nearly all focused on thin-film forms of hydrogenated silicon. Topics include: Staebler-Wronski and fundamental defect studies in amorphous silicon; the story of hydrogen in amorphous silicon; photoelectric properties of amorphous silicon; deposition and properties of microcrystalline silicon; deposition studies for amorphous silicon and related materials; solar cells; thin-film transistors and sensors and novel device concepts.
Amorphous and Heterogeneous Silicon Thin Films - 2000: Volume 609
Author | : Robert W. Collins |
Publisher | : |
Total Pages | : 1118 |
Release | : 2001-04-10 |
Genre | : Science |
ISBN | : |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques. Final Report, 1 January 1979-31 May 1980
Author | : |
Publisher | : |
Total Pages | : |
Release | : 1980 |
Genre | : |
ISBN | : |
Ion plating techniques for the preparation of hydrogenated amorphous silicon thin films have been successfully developed. The technique involves essentially the evaporation of elemental silicon through a d.c. produced hydrogen plasma. In this way hydrogen has been successfully incorporated into amorphous silicon films in concentrations as high as 30 atomic percent. Infrared spectroscopy indicates the usual SiHx stretching mode at approximately 2000 cm−1. Further evidence for the bonding of hydrogen was obtained from ESR measurement of hydrogenated and unhydrogenated samples. The measured unpaired spin density was a factor of 25 less in the hydrogenated sample. The optical absorption edges of the hydrogenated films fell in the usual range between 1.7 and 1.9 eV. Electrical conductivity measurements indicated a substantial reduction in the density of defect states in the gap as expected. It was also shown that hydrogenated amorphous silicon prepared by ion-plating could be doped by co-evaporation of the dopant element during film deposition. Both co-evaporated phosphorous and co-evaporated bismuth have been found to substantially increase the dark conductivity of a-Si:H while shifting the Fermi level towards the conduction band edge. An x-ray method for estimating the density and hydrogen content of a-Si:H has been developed. The measurement of strain in a-Si:H thin films is discussed. (WHK).
Amorphous and Heterogeneous Silicon-Based Films - 2001: Volume 664
Author | : Martin Stutzmann |
Publisher | : Cambridge University Press |
Total Pages | : 0 |
Release | : 2001-10-15 |
Genre | : Technology & Engineering |
ISBN | : 9781558996007 |
This book looks at the exchange of information on the physics and application of amorphous and microcrystalline silicon and presents exciting new developments. Significant progress has been made in the high- or even ultra-high-rate deposition of device-quality amorphous and microcrystalline silicon, in in-situ growth characterization techniques and in state-of-the-art computer modeling of deposition processes. These issues are especially important for the successful future commercialization of silicon thin-film devices. The latest results concerning silicon thin-film solar cells are highlighted. Active matrix arrays for displays or sensors continue to be the second major application of thin silicon films, and again much progress has been made in that area. Topics include: nucleation and growth; novel concepts; hot-wire CVD; high-rate deposition; growth of silicon and silicon-alloy thin films; crystallization; silicon-based alloys; structural properties of heterogeneous silicon films; dopants and impurities; amorphous and silicon solar cells; metastability; hydrogen and metastability; transport in µc-Si; thin-film transistors; hydrogenation and oxidation; defects and defect spectroscopy; structural and electronic properties of thin silicon films; heterojunctions; TFTs and sensors; amorphous-to-microcrystalline transition and structural relaxation and diffusion.
Amorphous and Heterogeneous Silicon-Based Films - 2001:
Author | : Martin Stutzmann |
Publisher | : Cambridge University Press |
Total Pages | : 1012 |
Release | : 2014-06-05 |
Genre | : Technology & Engineering |
ISBN | : 9781107412248 |
This book looks at the exchange of information on the physics and application of amorphous and microcrystalline silicon and presents exciting new developments. Significant progress has been made in the high- or even ultra-high-rate deposition of device-quality amorphous and microcrystalline silicon, in in-situ growth characterization techniques and in state-of-the-art computer modeling of deposition processes. These issues are especially important for the successful future commercialization of silicon thin-film devices. The latest results concerning silicon thin-film solar cells are highlighted. Active matrix arrays for displays or sensors continue to be the second major application of thin silicon films, and again much progress has been made in that area. Topics include: nucleation and growth; novel concepts; hot-wire CVD; high-rate deposition; growth of silicon and silicon-alloy thin films; crystallization; silicon-based alloys; structural properties of heterogeneous silicon films; dopants and impurities; amorphous and silicon solar cells; metastability; hydrogen and metastability; transport in µc-Si; thin-film transistors; hydrogenation and oxidation; defects and defect spectroscopy; structural and electronic properties of thin silicon films; heterojunctions; TFTs and sensors; amorphous-to-microcrystalline transition and structural relaxation and diffusion.
Handbook of Photovoltaic Silicon
Author | : Deren Yang |
Publisher | : Springer |
Total Pages | : 0 |
Release | : 2019-11-28 |
Genre | : Technology & Engineering |
ISBN | : 9783662564714 |
The utilization of sun light is one of the hottest topics in sustainable energy research. To efficiently convert sun power into a reliable energy – electricity – for consumption and storage, silicon and its derivatives have been widely studied and applied in solar cell systems. This handbook covers the photovoltaics of silicon materials and devices, providing a comprehensive summary of the state of the art of photovoltaic silicon sciences and technologies. This work is divided into various areas including but not limited to fundamental principles, design methodologies, wafering techniques/fabrications, characterizations, applications, current research trends and challenges. It offers the most updated and self-explanatory reference to all levels of students and acts as a quick reference to the experts from the fields of chemistry, material science, physics, chemical engineering, electrical engineering, solar energy, etc..