Complementary Metal Oxide Semiconductor
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| Author | : Kim Ho Yeap |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 162 |
| Release | : 2018-08-01 |
| Genre | : Technology & Engineering |
| ISBN | : 1789234964 |
In this book, Complementary Metal Oxide Semiconductor ( CMOS ) devices are extensively discussed. The topics encompass the technology advancement in the fabrication process of metal oxide semiconductor field effect transistors or MOSFETs (which are the fundamental building blocks of CMOS devices) and the applications of transistors in the present and future eras. The book is intended to provide information on the latest technology development of CMOS to researchers, physicists, as well as engineers working in the field of semiconductor transistor manufacturing and design.
| Author | : Daniel Durini |
| Publisher | : Woodhead Publishing |
| Total Pages | : 542 |
| Release | : 2019-10-19 |
| Genre | : Technology & Engineering |
| ISBN | : 0081024355 |
High Performance Silicon Imaging: Fundamentals and Applications of CMOS and CCD Sensors, Second Edition, covers the fundamentals of silicon image sensors, addressing existing performance issues and current and emerging solutions. Silicon imaging is a fast growing area of the semiconductor industry. Its use in cell phone cameras is already well established, with emerging applications including web, security, automotive and digital cinema cameras. The book has been revised to reflect the latest state-of-the art developments in the field, including 3D imaging, advances in achieving lower signal noise, and new applications for consumer markets. The fundamentals section has also been expanded to include a chapter on the characterization and testing of CMOS and CCD sensors that is crucial to the success of new applications. This book is an excellent resource for both academics and engineers working in the optics, photonics, semiconductor and electronics industries. - Covers the fundamentals of silicon-based image sensors and technical advances, focusing on performance issues - Looks at image sensors in applications, such as mobile phones, scientific imaging, and TV broadcasting, and in automotive, consumer and biomedical applications - Addresses the theory behind 3D imaging and 3D sensor development, including challenges and opportunities
| Author | : Masayoshi Esashi |
| Publisher | : John Wiley & Sons |
| Total Pages | : 528 |
| Release | : 2021-03-16 |
| Genre | : Technology & Engineering |
| ISBN | : 3527823255 |
Explore heterogeneous circuit integration and the packaging needed for practical applications of microsystems MEMS and system integration are important building blocks for the “More-Than-Moore” paradigm described in the International Technology Roadmap for Semiconductors. And, in 3D and Circuit Integration of MEMS, distinguished editor Dr. Masayoshi Esashi delivers a comprehensive and systematic exploration of the technologies for microsystem packaging and heterogeneous integration. The book focuses on the silicon MEMS that have been used extensively and the technologies surrounding system integration. You’ll learn about topics as varied as bulk micromachining, surface micromachining, CMOS-MEMS, wafer interconnection, wafer bonding, and sealing. Highly relevant for researchers involved in microsystem technologies, the book is also ideal for anyone working in the microsystems industry. It demonstrates the key technologies that will assist researchers and professionals deal with current and future application bottlenecks. Readers will also benefit from the inclusion of: A thorough introduction to enhanced bulk micromachining on MIS process, including pressure sensor fabrication and the extension of MIS process for various advanced MEMS devices An exploration of epitaxial poly Si surface micromachining, including process condition of epi-poly Si, and MEMS devices using epi-poly Si Practical discussions of Poly SiGe surface micromachining, including SiGe deposition and LP CVD polycrystalline SiGe A concise treatment of heterogeneously integrated aluminum nitride MEMS resonators and filters Perfect for materials scientists, electronics engineers, and electrical and mechanical engineers, 3D and Circuit Integration of MEMS will also earn a place in the libraries of semiconductor physicists seeking a one-stop reference for circuit integration and the practical application of microsystems.
| Author | : Tegze P. Haraszti |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 567 |
| Release | : 2007-05-08 |
| Genre | : Technology & Engineering |
| ISBN | : 0306470357 |
CMOS Memory Circuits is a systematic and comprehensive reference work designed to aid in the understanding of CMOS memory circuits, architectures, and design techniques. CMOS technology is the dominant fabrication method and almost the exclusive choice for semiconductor memory designers. Both the quantity and the variety of complementary-metal-oxide-semiconductor (CMOS) memories are staggering. CMOS memories are traded as mass-products worldwide and are diversified to satisfy nearly all practical requirements in operational speed, power, size, and environmental tolerance. Without the outstanding speed, power, and packing density characteristics of CMOS memories, neither personal computing, nor space exploration, nor superior defense systems, nor many other feats of human ingenuity could be accomplished. Electronic systems need continuous improvements in speed performance, power consumption, packing density, size, weight, and costs. These needs continue to spur the rapid advancement of CMOS memory processing and circuit technologies. CMOS Memory Circuits is essential for those who intend to (1) understand, (2) apply, (3) design and (4) develop CMOS memories.
| Author | : Masakazu Shoji |
| Publisher | : |
| Total Pages | : 434 |
| Release | : 1988-01 |
| Genre | : Digital integrated circuits |
| ISBN | : 9780131388437 |
| Author | : Arjuna Marzuki |
| Publisher | : CRC Press |
| Total Pages | : 287 |
| Release | : 2020-05-12 |
| Genre | : Technology & Engineering |
| ISBN | : 1000070522 |
Provides practical knowledge of CMOS analog and mixed-signal circuit design. Includes recent research in CMOS color and image sensor technology. Discusses sub-blocks of typical analog and mixed-signal IC products. Illustrates several design examples of analog circuits together with layout. Describes integrating based CMOS color circuit.
| Author | : Jun Ohta |
| Publisher | : CRC Press |
| Total Pages | : 310 |
| Release | : 2020-05-12 |
| Genre | : Technology & Engineering |
| ISBN | : 1498797342 |
Revised and expanded for this new edition, Smart CMOS Image Sensors and Applications, Second Edition is the only book available devoted to smart CMOS image sensors and applications. The book describes the fundamentals of CMOS image sensors and optoelectronic device physics, and introduces typical CMOS image sensor structures, such as the active pixel sensor (APS). Also included are the functions and materials of smart CMOS image sensors and present examples of smart imaging. Various applications of smart CMOS image sensors are also discussed. Several appendices supply a range of information on constants, illuminance, MOSFET characteristics, and optical resolution. Expansion of smart materials, smart imaging and applications, including biotechnology and optical wireless communication, are included. Features • Covers the fundamentals and applications including smart materials, smart imaging, and various applications • Includes comprehensive references • Discusses a wide variety of applications of smart CMOS image sensors including biotechnology and optical wireless communication • Revised and expanded to include the state of the art of smart image sensors
| Author | : Kim Ho Yeap |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 161 |
| Release | : 2018-02-28 |
| Genre | : Technology & Engineering |
| ISBN | : 9535138634 |
In this book, a variety of topics related to Very-Large-Scale Integration (VLSI) is extensively discussed. The topics encompass the physics of VLSI transistors, the process of integrated chip design and fabrication and the applications of VLSI devices. It is intended to provide information on the latest advancement of VLSI technology to researchers, physicists as well as engineers working in the field of semiconductor manufacturing and VLSI design.
| Author | : Etienne Sicard |
| Publisher | : McGraw Hill Professional |
| Total Pages | : 449 |
| Release | : 2007-03-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0071509062 |
Design and Simulate Any Type of CMOS Circuit! Electronic circuit designers and electronic engineering students can turn to Basics of CMOS Cell Design for a practice-based introduction to the design and simulation of every major type of CMOS (complementary metal oxide semiconductor) integrated circuit. You will find step-by-step explanations of everything they need for designing and simulating CMOS integrated circuits in deep-submicron technology, including MOS devices...inverters...interconnects...basic gates ...arithmetics...sequential cell design...and analog basic cells. The book also presents design rules, Microwind program operation and commands, design logic editor operation and commands, and quick-reference sheets. Filled with 100 skills-building illustrations, Basics of CMOS Cell Design features: Expert guidance on MOS device modeling Complete details on micron and deep-submicron technologies Clear, concise information on basic logic gates Full coverage of analog cells A wealth of circuit simulation tools Inside This Landmark CMOS Circuit Design Guide— • MOS Devices and Technology • MOS Modeling • The Inverter • Interconnects • Basic Gates • Arithmetics • Sequential Cell Design • Analog Cells • Appendices: Design Rules; Microwind Program Operation and Commands; Design Logic Editor Operation and Commands; Quick- Reference Sheets
| Author | : O. Kononchuk |
| Publisher | : Elsevier |
| Total Pages | : 503 |
| Release | : 2014-06-19 |
| Genre | : Technology & Engineering |
| ISBN | : 0857099256 |
Silicon-On-Insulator (SOI) Technology: Manufacture and Applications covers SOI transistors and circuits, manufacture, and reliability. The book also looks at applications such as memory, power devices, and photonics. The book is divided into two parts; part one covers SOI materials and manufacture, while part two covers SOI devices and applications. The book begins with chapters that introduce techniques for manufacturing SOI wafer technology, the electrical properties of advanced SOI materials, and modeling short-channel SOI semiconductor transistors. Both partially depleted and fully depleted SOI technologies are considered. Chapters 6 and 7 concern junctionless and fin-on-oxide field effect transistors. The challenges of variability and electrostatic discharge in CMOS devices are also addressed. Part two covers recent and established technologies. These include SOI transistors for radio frequency applications, SOI CMOS circuits for ultralow-power applications, and improving device performance by using 3D integration of SOI integrated circuits. Finally, chapters 13 and 14 consider SOI technology for photonic integrated circuits and for micro-electromechanical systems and nano-electromechanical sensors. The extensive coverage provided by Silicon-On-Insulator (SOI) Technology makes the book a central resource for those working in the semiconductor industry, for circuit design engineers, and for academics. It is also important for electrical engineers in the automotive and consumer electronics sectors. - Covers SOI transistors and circuits, as well as manufacturing processes and reliability - Looks at applications such as memory, power devices, and photonics
