Compact Modeling of Total Ionizing Dose and Aging Effects in MOS Technologies

Compact Modeling of Total Ionizing Dose and Aging Effects in MOS Technologies
Author:
Publisher:
Total Pages: 15
Release: 2015
Genre:
ISBN:

This paper presents a physics-based compact modeling approach that incorporates the impact of total ionizing dose (TID) and stress-induced defects into simulations of metal-oxide-semiconductor (MOS) devices and integrated circuits (ICs). This approach utilizes calculations of surface potential ([psi]s) to capture the charge contribution from oxide trapped charge and interface traps and to describe their impact on MOS electrostatics and device operating characteristics as a function of ionizing radiation exposure and aging effects. The modeling approach is demonstrated for bulk and silicon-on-insulator (SOI) MOS device. The formulation is verified using TCAD simulations and through the comparison of model calculations and experimental I-V characteristics from irradiated devices. The presented approach is suitable for modeling TID and aging effects in advanced MOS devices and ICs.

Analytical Models for Total Dose Ionization Effects in MOS Devices

Analytical Models for Total Dose Ionization Effects in MOS Devices
Author:
Publisher:
Total Pages: 55
Release: 2008
Genre:
ISBN:

MOS devices are susceptible to damage by ionizing radiation due to charge buildup in gate, field and SOI buried oxides. Under positive bias holes created in the gate oxide will transport to the Si / SiO2 interface creating oxide-trapped charge. As a result of hole transport and trapping, hydrogen is liberated in the oxide which can create interface-trapped charge. The trapped charge will affect the threshold voltage and degrade the channel mobility. Neutralization of oxidetrapped charge by electron tunneling from the silicon and by thermal emission can take place over long periods of time. Neutralization of interface-trapped charge is not observed at room temperature. Analytical models are developed that account for the principal effects of total dose in MOS devices under different gate bias. The intent is to obtain closed-form solutions that can be used in circuit simulation. Expressions are derived for the aging effects of very low dose rate radiation over long time periods.

Nanotechnology in Electronics

Nanotechnology in Electronics
Author: Visakh P. M.
Publisher: John Wiley & Sons
Total Pages: 389
Release: 2022-10-07
Genre: Technology & Engineering
ISBN: 3527824235

Nanotechnology in Electronics Enables readers to understand and apply state-of-the-art concepts surrounding modern nanotechnology in electronics Nanotechnology in Electronics summarizes numerous research accomplishments in the field, covering novel materials for electronic applications (such as graphene, nanowires, and carbon nanotubes) and modern nanoelectronic devices (such as biosensors, optoelectronic devices, flexible electronics, nanoscale batteries, and nanogenerators) that are used in many different fields (such as sensor technology, energy generation, data storage and biomedicine). Edited by four highly qualified researchers and professionals in the field, other specific sample topics covered in Nanotechnology in Electronics include: Graphene-based nanoelectronics biosensors, including the history, properties, and fundamentals of graphene, plus fundamentals of graphene derivatives and the synthesis of graphene Zinc oxide piezoelectronic nanogenerators for low frequency applications, with an introduction to zinc oxide and zinc oxide piezoelectric nanogenerators Investigation of the hot junctionless mosfets, including an overview of the junctionless paradigm and a simulation framework of the hot carrier degradation Conductive nanomaterials for printed/flexible electronics application and metal oxide semiconductors for non-invasive diagnosis of breast cancer The fundamental aspects and applications of multiferroic-based spintronic devices and quartz tuning fork based nanosensors. Containing in-depth information on the topic and written intentionally to help with the practical application of concepts described within, Nanotechnology in Electronics is a must-have reference for materials scientists, electronics engineers, and engineering scientists who wish to understand and harness the state of the art in the field.

Ionizing Radiation Effects in MOS Devices and Circuits

Ionizing Radiation Effects in MOS Devices and Circuits
Author: T. P. Ma
Publisher: John Wiley & Sons
Total Pages: 616
Release: 1989-04-18
Genre: Technology & Engineering
ISBN: 9780471848936

The first comprehensive overview describing the effects of ionizing radiation on MOS devices, as well as how to design, fabricate, and test integrated circuits intended for use in a radiation environment. Also addresses process-induced radiation effects in the fabrication of high-density circuits. Reviews the history of radiation-hard technology, providing background information for those new to the field. Includes a comprehensive review of the literature and an annotated listing of research activities in radiation-hardness research.

Total Ionizing Dose Effects on MOS and Bipolar Devices in the Natural Space Radiation Environment

Total Ionizing Dose Effects on MOS and Bipolar Devices in the Natural Space Radiation Environment
Author:
Publisher:
Total Pages: 8
Release: 1998
Genre:
ISBN:

Mechanisms that control the response of MOS and bipolar devices to ionizing radiation in the natural space environment are briefly reviewed. Standard tests based on room-temperature irradiation and elevated temperature annealing are described for MOS devices to bound the effects of oxide and interface-trap charge in space. For bipolar devices that exhibit enhanced low-dose-rate sensitivity, a standard test equivalent to that developed for MOS devices is not available. However, screening techniques based on room temperature and/or elevated temperature irradiations are described which can minimize the risk to spacecraft and satellite electronics from this phenomenon.

Compact Modeling

Compact Modeling
Author: Gennady Gildenblat
Publisher: Springer Science & Business Media
Total Pages: 531
Release: 2010-06-22
Genre: Technology & Engineering
ISBN: 9048186145

Most of the recent texts on compact modeling are limited to a particular class of semiconductor devices and do not provide comprehensive coverage of the field. Having a single comprehensive reference for the compact models of most commonly used semiconductor devices (both active and passive) represents a significant advantage for the reader. Indeed, several kinds of semiconductor devices are routinely encountered in a single IC design or in a single modeling support group. Compact Modeling includes mostly the material that after several years of IC design applications has been found both theoretically sound and practically significant. Assigning the individual chapters to the groups responsible for the definitive work on the subject assures the highest possible degree of expertise on each of the covered models.

Radiation Tolerant Electronics, Volume II

Radiation Tolerant Electronics, Volume II
Author: Paul LeRoux
Publisher: Mdpi AG
Total Pages: 0
Release: 2023-01-16
Genre: Technology & Engineering
ISBN: 9783036564456

Research on radiation tolerant electronics has increased rapidly over the last few years, resulting in many interesting approaches to model radiation effects and design radiation hardened integrated circuits and embedded systems. This research is strongly driven by the growing need for radiation hardened electronics for space applications, high-energy physics experiments such as those on the large hadron collider at CERN, and many terrestrial nuclear applications, including nuclear energy and safety management. With the progressive scaling of integrated circuit technologies and the growing complexity of electronic systems, their ionizing radiation susceptibility has raised many exciting challenges, which are expected to drive research in the coming decade. After the success of the first Special Issue on Radiation Tolerant Electronics, the current Special Issue features thirteen articles highlighting recent breakthroughs in radiation tolerant integrated circuit design, fault tolerance in FPGAs, radiation effects in semiconductor materials and advanced IC technologies and modelling of radiation effects.

Charge-Based MOS Transistor Modeling

Charge-Based MOS Transistor Modeling
Author: Christian C. Enz
Publisher: John Wiley & Sons
Total Pages: 328
Release: 2006-08-14
Genre: Technology & Engineering
ISBN: 0470855452

Modern, large-scale analog integrated circuits (ICs) are essentially composed of metal-oxide semiconductor (MOS) transistors and their interconnections. As technology scales down to deep sub-micron dimensions and supply voltage decreases to reduce power consumption, these complex analog circuits are even more dependent on the exact behavior of each transistor. High-performance analog circuit design requires a very detailed model of the transistor, describing accurately its static and dynamic behaviors, its noise and matching limitations and its temperature variations. The charge-based EKV (Enz-Krummenacher-Vittoz) MOS transistor model for IC design has been developed to provide a clear understanding of the device properties, without the use of complicated equations. All the static, dynamic, noise, non-quasi-static models are completely described in terms of the inversion charge at the source and at the drain taking advantage of the symmetry of the device. Thanks to its hierarchical structure, the model offers several coherent description levels, from basic hand calculation equations to complete computer simulation model. It is also compact, with a minimum number of process-dependant device parameters. Written by its developers, this book provides a comprehensive treatment of the EKV charge-based model of the MOS transistor for the design and simulation of low-power analog and RF ICs. Clearly split into three parts, the authors systematically examine: the basic long-channel intrinsic charge-based model, including all the fundamental aspects of the EKV MOST model such as the basic large-signal static model, the noise model, and a discussion of temperature effects and matching properties; the extended charge-based model, presenting important information for understanding the operation of deep-submicron devices; the high-frequency model, setting out a complete MOS transistor model required for designing RF CMOS integrated circuits. Practising engineers and circuit designers in the semiconductor device and electronics systems industry will find this book a valuable guide to the modelling of MOS transistors for integrated circuits. It is also a useful reference for advanced students in electrical and computer engineering.