Chemical Perspectives Of Microelectronic Materials
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Author | : C. R. Abernathy |
Publisher | : Mrs Proceedings |
Total Pages | : 760 |
Release | : 1993-03-23 |
Genre | : Technology & Engineering |
ISBN | : |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author | : |
Publisher | : |
Total Pages | : 626 |
Release | : 1990 |
Genre | : Microelectronics |
ISBN | : |
Author | : Mihal E. Gross |
Publisher | : Cambridge University Press |
Total Pages | : 668 |
Release | : 2014-06-05 |
Genre | : Technology & Engineering |
ISBN | : 9781107410848 |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author | : L. V. Interrante |
Publisher | : |
Total Pages | : 626 |
Release | : 1991-04-23 |
Genre | : Technology & Engineering |
ISBN | : |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author | : |
Publisher | : |
Total Pages | : 762 |
Release | : 1992 |
Genre | : Microelectronics |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : |
Release | : 1991 |
Genre | : |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : 4 |
Release | : 1994 |
Genre | : |
ISBN | : |
Symposium E opened with presentations spanning a range of new directions in the Chemistry of Electronic Materials. Novel methods for patterning or deposition of materials and for IN SITU monitoring of materials processing were highlighted. Very fine dimensional control over growth using focussed laser beams, controlled use of surface chemistry, and photochemistry were all demonstrated. Several commercial applications of monolayer control of film growth and uniformity using atomic layer epitaxy were reported. IN SITU probing of surface species and topography during film growth using IR spectroscopy, and TEM and AFM microscopies revealed new details of growth mechanisms. Despite decades of work in Si chemistry, this area continues to thrive. jg p.1.
Author | : C.R.M. Grovenor |
Publisher | : Routledge |
Total Pages | : 557 |
Release | : 2017-10-05 |
Genre | : Science |
ISBN | : 1351431544 |
This practical book shows how an understanding of structure, thermodynamics, and electrical properties can explain some of the choices of materials used in microelectronics, and can assist in the design of new materials for specific applications. It emphasizes the importance of the phase chemistry of semiconductor and metal systems for ensuring the long-term stability of new devices. The book discusses single-crystal and polycrystalline silicon, aluminium- and gold-based metallisation schemes, packaging semiconductor devices, failure analysis, and the suitability of various materials for optoelectronic devices and solar cells. It has been designed for senior undergraduates, graduates, and researchers in physics, electronic engineering, and materials science.
Author | : Joachim Bargon |
Publisher | : Springer Science & Business Media |
Total Pages | : 367 |
Release | : 2013-03-09 |
Genre | : Science |
ISBN | : 1468448471 |
The papers collected in this volume were presented at the International Symposium on Methods and Materials in Microelectronic Technology. This symposium was sponsored by IBM Germany, and it was held September 29 - October 1, 1982, in Bad Neuenahr, West Germany. The progress of semiconductor and microelectronic technology has become so rapid and the field so sophisticated that it is imperative to exchange the latest insight gained as frequently as it can be accomplished. In addition, it is peculiar for this field that the bulk of the investigations are carried out at industrial research and development laboratories, which makes some of the results less readily accessible. Because of these circumstances, the academic community, which among other things, is supposed to communicate the prog ress in this field to students of different disciplines, finds it rather difficult to stay properly informed. It was the intent of this IBM sponsored symposium to bring together key scientists from academic institutions, primarily from Europe, with principal investigators of the industrial scene. Accordingly, this symposium exposed technologists to scientists and vice versa. Scientific advances often lead directly to technological innovations. In turn, new technologies are often arrived at empirically and, because of that, are initially poorly understood. Scientific inquiry then attempts to probe these processes and phenomena in order to achieve a better understanding. Thus science and technology are intricately interconnected, and it is important that technical exchange between technolo gists and scientists is facilitated, since the problems are typically interdiscipli nary in nature.
Author | : R.A. Levy |
Publisher | : Springer Science & Business Media |
Total Pages | : 992 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9400909179 |
The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.