Basic Atomic Interactions of Accelerated Heavy Ions in Matter

Basic Atomic Interactions of Accelerated Heavy Ions in Matter
Author: Inga Tolstikhina
Publisher: Springer
Total Pages: 228
Release: 2018-02-28
Genre: Science
ISBN: 3319749927

This book provides an overview of the recent experimental and theoretical results on interactions of heavy ions with gaseous, solid and plasma targets from the perspective of atomic physics. The topics discussed comprise stopping power, multiple-electron loss and capture processes, equilibrium and non-equilibrium charge-state fractions in penetration of fast ion beams through matter including relativistic domain. It also addresses mean charge-states and equilibrium target thickness in ion-beam penetrations, isotope effects in low-energy electron capture, lifetimes of heavy ion beams, semi-empirical formulae for effective cross sections. The book is intended for researchers and graduate students working in atomic, plasma and accelerator physics.

Atomic Processes in Electron-Ion and Ion-Ion Collisions

Atomic Processes in Electron-Ion and Ion-Ion Collisions
Author: F. Brouillard
Publisher: Springer Science & Business Media
Total Pages: 495
Release: 2013-03-09
Genre: Technology & Engineering
ISBN: 146845224X

Four years after a first meeting in BADDECK, Canada, on the Physics of Ion-Ion and Electron-Ion collisions, a second Nato Advanced Study Institute, in HAl~/Lesse, Belgium, reexamined the subject which had become almost a new one, in consideration of the many important developments that had occured in the mean time. The developments have been particularly impressive in two areas : the di-electronic recombination of electrons with ions and the collisional processes of mUltiply charged ions. For dielectronic recombination, a major event was the obtainment, in 1983, of the first experimental data. This provided, at last, a non speculative basis for the study of that intricate and subtle process and strongly stimulated the theoretical activities. Multiply charged ions, on the other hand, have become popular, thanks to the development of powerful ion sources. This circumstance, together with a pressing demand from thermonuclear research for ionisation and charge exchange cross sections, has triggered systematic experimental investigations and new theoretical studies, which have contributed to considerably enlarge, over the last five years, our understanding of the collisional processes of multiply charged ions. Dielectronic recombination and multiply charged ions were therefore central points in the programme of the A.S.I. in HAN/Lesse and are given a corresponding emphasis in the present book.

Classical Treatment of Collisions Between Ions and Atoms or Molecules

Classical Treatment of Collisions Between Ions and Atoms or Molecules
Author: Francois Frémont
Publisher: Springer Nature
Total Pages: 247
Release: 2021-12-08
Genre: Science
ISBN: 3030894282

Since the beginning of the twentieth century, many experimental and theoretical works have been devoted to collisions between highly charged ions and atomic and molecular targets. It was realized that quantum mechanics is the only way, a priori, to describe such atomic phenomena. However, since quantum mechanics is very difficult to apply for collision systems with more than two particles, classical methods were very soon introduced and applied to simple collision systems and, subsequently, to more complicated systems. The results obtained by such classical methods were found to be surprisingly good, and classical mechanics is now well established, despite its approximations, as a replacement for or competition with quantum mechanics in many cases. In this book, the author will focus on the development of classical methods for describing collisional and post-collisional processes. The results will be compared with those found using quantum mechanical models, in order to demonstrate the ability of the classical approach to obtain many features and details of collision systems.

Principles of Vapor Deposition of Thin Films

Principles of Vapor Deposition of Thin Films
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
Total Pages: 1173
Release: 2005-12-16
Genre: Technology & Engineering
ISBN: 0080480314

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Advances in Atomic, Molecular, and Optical Physics

Advances in Atomic, Molecular, and Optical Physics
Author:
Publisher: Elsevier
Total Pages: 497
Release: 1994-07-26
Genre: Science
ISBN: 0080561446

The latest volume in the highly acclaimed series addresses atomic collisions, assessing the status of the current knowledge, identifying deficiencies, and exploring ways to improve the quality of cross-section data.Eleven articles, written by foremost experts, focus on cross-section determination by experiment or theory, on needs in selected applications, and on efforts toward the compilation and dissemination of data. This is the first volume edited under the additional direction of Herbert Walther. Presents absolute cross sections for atomic collisions Uses benchmark measurements and benchmark calculations Discusses needs for cross-section data in applications Contains a guide to data resources, bibliographies, and compendia

An Introduction to Gas Discharges

An Introduction to Gas Discharges
Author: A. M. Howatson
Publisher: Elsevier
Total Pages: 257
Release: 2013-10-22
Genre: Science
ISBN: 1483138364

An Introduction to Gas Discharges: Second Edition aims to provide a compact introduction to the subject of gas discharges, which continues to make both scientific and industrial progress. In this second edition, the author has made minor corrections, rewritten and expanded some sections, used SI units and modernized notions, in hopes of making the book more up to date. Included in the book is a short history of the subject, an introduction that enumerates the types of gas discharges, the fundamental processes, and then moves on to the more specific areas such as the breakdown, the self-sustaining discharge, equilibrium, plasma properties and measurements, and the technological applications of gas discharges. Concise and easy to understand, the text is for students and researchers who wish to learn the subject and prepare them for more advanced readings.