Bulk Sensitive Photoelectron Spectroscopy Of Strongly Correlated Transition Metal Oxides
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| Author | : Shigemasa Suga |
| Publisher | : Springer Nature |
| Total Pages | : 511 |
| Release | : 2021-08-01 |
| Genre | : Science |
| ISBN | : 3030640736 |
This book presents photoelectron spectroscopy as a valuable method for studying the electronic structures of various solid materials in the bulk state, on surfaces, and at buried interfaces. This second edition introduces the advanced technique of high-resolution and high-efficiency spin- and momentum-resolved photoelectron spectroscopy using a novel momentum microscope, enabling high-precision measurements down to a length scale of some tens of nanometers. The book also deals with fundamental concepts and approaches to applying this and other complementary techniques, such as inverse photoemission, photoelectron diffraction, scanning tunneling spectroscopy, as well as photon spectroscopy based on (soft) x-ray absorption and resonance inelastic (soft) x-ray scattering. This book is the ideal tool to expand readers’ understanding of this marvelously versatile experimental method, as well as the electronic structures of metals and insulators.
| Author | : Joseph Woicik |
| Publisher | : Springer |
| Total Pages | : 576 |
| Release | : 2015-12-26 |
| Genre | : Science |
| ISBN | : 3319240439 |
This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.
| Author | : Nihon Butsuri Gakkai |
| Publisher | : |
| Total Pages | : 794 |
| Release | : 2010 |
| Genre | : Physics |
| ISBN | : |
| Author | : Yoichi Okimoto |
| Publisher | : Springer Nature |
| Total Pages | : 180 |
| Release | : 2021-05-13 |
| Genre | : Science |
| ISBN | : 9811579296 |
This book describes the history of and recent developments in cobaltite and the spin-crossover (SC) phenomena. It offers readers an overview of essential research conducted on cobaltite and introduces them to the fundamentals of condensed matter physics research. The book consists of two parts. The first part reviews SC phenomena, covering the fundamental physics of SC phenomena and basic material properties of cobaltite. The second part focuses on recent topics in SC cobaltite, including the optical and dynamical features of cobaltite, thin material fabrication, and thermoelectric properties. The comprehensive coverage and clearly structured topics will especially appeal to newcomers to the field of state-of-the-art research on cobaltite and SC physics.
| Author | : Norman Mannella |
| Publisher | : |
| Total Pages | : 684 |
| Release | : 2003 |
| Genre | : |
| ISBN | : |
| Author | : Eva Pavarini |
| Publisher | : Forschungszentrum Jülich |
| Total Pages | : 459 |
| Release | : 2014 |
| Genre | : |
| ISBN | : 3893369538 |
| Author | : Eva Pavarini |
| Publisher | : Forschungszentrum Jülich |
| Total Pages | : 450 |
| Release | : 2012 |
| Genre | : |
| ISBN | : 9783893367962 |
| Author | : Frank de Groot |
| Publisher | : CRC Press |
| Total Pages | : 512 |
| Release | : 2008-03-10 |
| Genre | : Science |
| ISBN | : 1420008420 |
Core level spectroscopy has become a powerful tool in the study of electronic states in solids. From fundamental aspects to the most recent developments, Core Level Spectroscopy of Solids presents the theoretical calculations, experimental data, and underlying physics of x-ray photoemission spectroscopy (XPS), x-ray absorption spectroscopy (XAS), x
| Author | : Claudia Cancellieri |
| Publisher | : Springer |
| Total Pages | : 326 |
| Release | : 2018-04-09 |
| Genre | : Technology & Engineering |
| ISBN | : 3319749897 |
This book summarizes the most recent and compelling experimental results for complex oxide interfaces. The results of this book were obtained with the cutting-edge photoemission technique at highest energy resolution. Due to their fascinating properties for new-generation electronic devices and the challenge of investigating buried regions, the book chiefly focuses on complex oxide interfaces. The crucial feature of exploring buried interfaces is the use of soft X-ray angle-resolved photoemission spectroscopy (ARPES) operating on the energy range of a few hundred eV to increase the photoelectron mean free path, enabling the photons to penetrate through the top layers – in contrast to conventional ultraviolet (UV)-ARPES techniques. The results presented here, achieved by different research groups around the world, are summarized in a clearly structured way and discussed in comparison with other photoemission spectroscopy techniques and other oxide materials. They are complemented and supported by the most recent theoretical calculations as well as results of complementary experimental techniques including electron transport and inelastic resonant X-ray scattering.
| Author | : Gertjan Koster |
| Publisher | : Elsevier |
| Total Pages | : 295 |
| Release | : 2011-10-05 |
| Genre | : Technology & Engineering |
| ISBN | : 0857094955 |
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
