Auger Electron Spectroscopy
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| Author | : G. McGuire |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 144 |
| Release | : 2013-03-09 |
| Genre | : Science |
| ISBN | : 1475717024 |
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
| Author | : Thomas Carlson |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 427 |
| Release | : 2013-11-11 |
| Genre | : Science |
| ISBN | : 1475701187 |
In 1970 when I first seriously contemplated writing a book on electron spectroscopy, I recognized the impossibility of completely reaching my desired goals. First, the field was expanding (and still is) at such a rate that a definitive statement of the subject is not possible. The act of following the literature comprehensively and summarizing its essential content proved to be a diver gent series. On the other hand, the field has increased to such a size that violent changes in its basic makeup no longer occur with the frequency that was present in its early days. Furthermore, the excitement of electron spectro scopy lies in its many-faceted interrelationships. In the era of specialization, electron spectroscopy is an open-ended subject continually bringing together new aspects of science. I wished to discuss not just one type of electron spectro scopy, but as many as would be possible. The book as it stands concentrates its attention on x-ray photoelectron spectroscopy, but also presents the basis of Auger electron spectroscopy and uv photoelectron spectroscopy, as well as mentioning many of the other branches of the field. A large, many-author volume might be an answer to some of these problems. However, though anyone person possesses only a limited amount of expertise, I have always enjoyed books by a single author since what they lack in detailed knowledge they gain in a unified viewpoint. I hope the final product, though limited in its attainment of these goals, will still be of some merit.
| Author | : Siegfried Hofmann |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 544 |
| Release | : 2012-10-25 |
| Genre | : Science |
| ISBN | : 3642273807 |
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
| Author | : D.R. Vij |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 748 |
| Release | : 2007-02-15 |
| Genre | : Science |
| ISBN | : 0387375902 |
Solid-State spectroscopy is a burgeoning field with applications in many branches of science, including physics, chemistry, biosciences, surface science, and materials science. This handbook brings together in one volume information about various spectroscopic techniques that is currently scattered in the literature of these disciplines. This concise yet comprehensive volume covers theory and applications of a broad range of spectroscopies. It provides an overview of sixteen spectroscopic technique and self-contained chapters present up-to-date scientific and technical information and references with minimal overlap and redundancy.
| Author | : John F. Watts |
| Publisher | : John Wiley & Sons |
| Total Pages | : 320 |
| Release | : 2019-08-27 |
| Genre | : Technology & Engineering |
| ISBN | : 1119417643 |
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
| Author | : D Chattarji |
| Publisher | : Elsevier |
| Total Pages | : 278 |
| Release | : 2012-12-02 |
| Genre | : Science |
| ISBN | : 0323158064 |
The Theory of Auger Transitions reviews the Auger effect theory, relating it to the broad spectrum of atomic and physical theory. This book discusses the Auger effect involving discrete and continuous states of the atomic system, which can be used as a good testing ground for fundamental atomic theory, such as the various atomic models and their concomitant wave functions. The application of Auger spectroscopy to surface chemical analysis is also elaborated. Other topics include the symmetry and invariance, theory of the Auger process, coulomb field and coulomb wave functions, and symmetry-breaking and classification of states. The central-field calculations, many-electron atom, advances in Auger theory, and Auger electron spectroscopy and its application to surface science are likewise covered in this text. This publication is intended for scientists and atomic physicists, but is also useful to theoreticians and graduate student specializing in atomic physics.
| Author | : Mauro Sardela |
| Publisher | : Springer |
| Total Pages | : 242 |
| Release | : 2014-07-10 |
| Genre | : Technology & Engineering |
| ISBN | : 1461492815 |
Practical Materials Characterization covers the most common materials analysis techniques in a single volume. It stands as a quick reference for experienced users, as a learning tool for students, and as a guide for the understanding of typical data interpretation for anyone looking at results from a range of analytical techniques. The book includes analytical methods covering microstructural, surface, morphological, and optical characterization of materials with emphasis on microscopic structural, electronic, biological, and mechanical properties. Many examples in this volume cover cutting-edge technologies such as nanomaterials and life sciences.
| Author | : C.L. Briant |
| Publisher | : Elsevier |
| Total Pages | : 272 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0323158331 |
Treatise on Materials Science and Technology, Volume 30: Auger Electron Spectroscopy examines Auger electron spectroscopy and its various uses, emphasizing both theoretical and experimental studies. This book discusses the historical development of auger electron spectroscopy, studies of surface segregation kinetics by auger electron spectroscopy, and local electronic structure information in auger electron spectroscopy. The metallurgical applications of auger electron spectroscopy and auger photoelectron coincidence spectroscopy are also elaborated. Other topics include the measurement of surface segregation kinetics by Auger electron spectroscopy, tempered martensite embrittlement, embrittlement of nonferrous alloys, and analysis of particle-matrix interfaces. The high-resolution scanning Auger electron spectroscopy, corrosion and stress corrosion cracking, and APECS instrumentation are likewise covered in this publication. This volume is suitable for researchers and electrical engineering students conducting work on Auger electron spectroscopy.
| Author | : David Briggs |
| Publisher | : Im Publications |
| Total Pages | : 899 |
| Release | : 2003-01-01 |
| Genre | : Electron spectroscopy |
| ISBN | : 9781901019049 |
| Author | : Martin Prutton |
| Publisher | : John Wiley & Sons |
| Total Pages | : 384 |
| Release | : 2006-05-01 |
| Genre | : Technology & Engineering |
| ISBN | : 0470866780 |
This eagerly-awaited volume has been edited by two academic researchers with extensive and reputable experience in this field. Emphasis is given to the underlying science of the method of Auger microscopy, and its instrumental realization, the visualization and interpretation of the data in the sets of the images that form the output of the measurements and the methods used to quantify the images. Imaging artefacts in Auger microscopy and methods to correct them are also detailed. The authors describe the technique of Multi-Spectral Auger Microscopy (MULSAM) and demonstrate its advantages in mapping complex multi-component surfaces. The book concludes with an outlook for the future of Auger microscopy.
