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| Author | : Cheol Seong Hwang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 266 |
| Release | : 2013-10-18 |
| Genre | : Science |
| ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
| Author | : Nathan J Patmore |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 210 |
| Release | : 2018-11-16 |
| Genre | : Science |
| ISBN | : 1788010671 |
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
| Author | : Nicola Pinna |
| Publisher | : John Wiley & Sons |
| Total Pages | : 463 |
| Release | : 2012-09-19 |
| Genre | : Technology & Engineering |
| ISBN | : 3527639926 |
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
| Author | : Andrew Y. C. Nee |
| Publisher | : Springer |
| Total Pages | : 0 |
| Release | : 2014-10-31 |
| Genre | : Technology & Engineering |
| ISBN | : 9781447146698 |
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
| Author | : Pietro Mandracci |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 166 |
| Release | : 2019-01-10 |
| Genre | : Technology & Engineering |
| ISBN | : 1789849608 |
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
| Author | : Anthony C. Jones |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 600 |
| Release | : 2009 |
| Genre | : Science |
| ISBN | : 0854044655 |
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
| Author | : Julien Bachmann |
| Publisher | : John Wiley & Sons |
| Total Pages | : 366 |
| Release | : 2017-03-15 |
| Genre | : Technology & Engineering |
| ISBN | : 3527694838 |
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
| Author | : Charles Bishop |
| Publisher | : William Andrew |
| Total Pages | : 603 |
| Release | : 2015-08-15 |
| Genre | : Technology & Engineering |
| ISBN | : 0323296904 |
Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit 'boards', and flexible displays. In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD). - Provides the know-how to maximize productivity of vacuum coating systems - Thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest on Atomic Layer Deposition (ALD) - Presents the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating - Enables engineers to specify systems more effectively and enhances dialogue between non-specialists and suppliers/engineers - Empowers those in rapidly expanding fields such as solar energy, display panels, and flexible electronics to unlock the potential of vacuum coating to transform their processes and products
| Author | : Lide M Rodriguez-Martinez |
| Publisher | : William Andrew |
| Total Pages | : 348 |
| Release | : 2017-02-06 |
| Genre | : Technology & Engineering |
| ISBN | : 0323429963 |
Emerging Nanotechnologies in Rechargeable Energy Storage Systems addresses the technical state-of-the-art of nanotechnology for rechargeable energy storage systems. Materials characterization and device-modeling aspects are covered in detail, with additional sections devoted to the application of nanotechnology in batteries for electrical vehicles. In the later part of the book, safety and regulatory issues are thoroughly discussed. Users will find a valuable source of information on the latest developments in nanotechnology in rechargeable energy storage systems. This book will be of great use to researchers and graduate students in the fields of nanotechnology, electrical energy storage, and those interested in materials and electrochemical cell development. - Gives readers working in the rechargeable energy storage sector a greater awareness on how novel nanotechnology oriented methods can help them develop higher-performance batteries and supercapacitor systems - Provides focused coverage of the development, process, characterization techniques, modeling, safety and applications of nanomaterials for rechargeable energy storage systems - Presents readers with an informed choice in materials selection for rechargeable energy storage devices
| Author | : M. L. Hitchman |
| Publisher | : Academic Press |
| Total Pages | : 692 |
| Release | : 1993-04-13 |
| Genre | : Science |
| ISBN | : |
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
