Atomic Layer Deposition Applications 4
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| Author | : Julien Bachmann |
| Publisher | : John Wiley & Sons |
| Total Pages | : 366 |
| Release | : 2017-03-15 |
| Genre | : Technology & Engineering |
| ISBN | : 3527694838 |
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
| Author | : Ana Londergan |
| Publisher | : The Electrochemical Society |
| Total Pages | : 379 |
| Release | : 2008 |
| Genre | : Chemical vapor deposition |
| ISBN | : 1566776503 |
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. This issue of the ECS Transactions contains peer reviewed papers presented at the symposium. Breadths of ALD Applications are featured: novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics and a variety of other emerging applications.
| Author | : Tommi Kääriäinen |
| Publisher | : John Wiley & Sons |
| Total Pages | : 274 |
| Release | : 2013-05-28 |
| Genre | : Technology & Engineering |
| ISBN | : 1118062779 |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
| Author | : Nicola Pinna |
| Publisher | : John Wiley & Sons |
| Total Pages | : 463 |
| Release | : 2012-09-19 |
| Genre | : Technology & Engineering |
| ISBN | : 3527639926 |
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
| Author | : Cheol Seong Hwang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 266 |
| Release | : 2013-10-18 |
| Genre | : Science |
| ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
| Author | : Pietro Mandracci |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 166 |
| Release | : 2019-01-10 |
| Genre | : Technology & Engineering |
| ISBN | : 1789849608 |
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
| Author | : Nathan J Patmore |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 210 |
| Release | : 2018-11-16 |
| Genre | : Science |
| ISBN | : 1788010671 |
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
| Author | : Andrew Y. C. Nee |
| Publisher | : Springer |
| Total Pages | : 0 |
| Release | : 2014-10-31 |
| Genre | : Technology & Engineering |
| ISBN | : 9781447146698 |
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
| Author | : Anthony C. Jones |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 600 |
| Release | : 2009 |
| Genre | : Science |
| ISBN | : 0854044655 |
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
| Author | : Jeannie Valdez |
| Publisher | : |
| Total Pages | : 183 |
| Release | : 2015 |
| Genre | : TECHNOLOGY & ENGINEERING |
| ISBN | : 9781634839204 |
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
