Atomic Layer Deposition Applications 13
| Author | : F. Roozeboom |
| Publisher | : The Electrochemical Society |
| Total Pages | : 128 |
| Release | : |
| Genre | : |
| ISBN | : 1607688204 |
Atomic Layer Deposition Applications 13
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Atomic Layer Deposition
| Author | : Tommi Kääriäinen |
| Publisher | : John Wiley & Sons |
| Total Pages | : 274 |
| Release | : 2013-05-28 |
| Genre | : Technology & Engineering |
| ISBN | : 1118062779 |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Atomic Layer Deposition for Semiconductors
| Author | : Cheol Seong Hwang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 266 |
| Release | : 2013-10-18 |
| Genre | : Science |
| ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Atomic Layer Deposition of Nanostructured Materials
| Author | : Nicola Pinna |
| Publisher | : John Wiley & Sons |
| Total Pages | : 463 |
| Release | : 2012-09-19 |
| Genre | : Technology & Engineering |
| ISBN | : 3527639926 |
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Organometallic Chemistry
| Author | : Nathan J Patmore |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 210 |
| Release | : 2018-11-16 |
| Genre | : Science |
| ISBN | : 1788010671 |
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
Chemical Vapor Deposition for Nanotechnology
| Author | : Pietro Mandracci |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 166 |
| Release | : 2019-01-10 |
| Genre | : Technology & Engineering |
| ISBN | : 1789849608 |
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Atomic Layer Deposition Applications 3
| Author | : Ana Londergan |
| Publisher | : The Electrochemical Society |
| Total Pages | : 300 |
| Release | : 2007 |
| Genre | : Atomic layer deposition |
| ISBN | : 1566775736 |
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.
Atomic Layer Deposition for Nanotechnology
| Author | : Arthur Sherman |
| Publisher | : |
| Total Pages | : 239 |
| Release | : 2008 |
| Genre | : Atomic layer deposition |
| ISBN | : 9780981466378 |
Chemical Vapour Deposition
| Author | : Anthony C. Jones |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 600 |
| Release | : 2009 |
| Genre | : Science |
| ISBN | : 0854044655 |
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Atomic Layer Deposition
| Author | : David Cameron |
| Publisher | : MDPI |
| Total Pages | : 142 |
| Release | : 2020-12-28 |
| Genre | : Science |
| ISBN | : 3039366521 |
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
